High Speed Atomic Layer Deposition of Broadband Antireflection Coatings based on Nanoporous Alumina
Spatial ALD and hot water treatment to nanoporous alumina were used to prepare a broadband antireflection coating. High deposition rate and low average reflection below 0.01% in the visible range were achieved.
Authors
- Jani Holopainen (ORCID: https://orcid.org/0000-0002-9648-5430)
- S. Mingels (ORCID: https://orcid.org/0000-0002-5994-1222)
- Awalendra K. Thakur (ORCID: https://orcid.org/0000-0002-8465-9763)
- Harro Hagedorn
- Adriana Szeghalmi (ORCID: https://orcid.org/0000-0003-2055-2825)
Institutions
- Siemens (Germany) (DE)
- Fraunhofer Institute for Applied Optics and Precision Engineering (DE)
- Bühler (Germany) (DE)
Publication Details
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1364/oic.2025.thc.3
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00