Stress Compensation in TiO2/SiO2 Optical Coatings by Manipulating the Thickness Modulation Ratio

With the rapid advancement of high-precision optical systems, increasingly stringent demands are imposed on the surface figure accuracy of optical components. The magnitude of residual stress in multilayer films directly influences the post-coating surface figure stability of these components, making the control of multilayer film stress a critical factor in enhancing optical surface figure accuracy. In this study, which addresses the process constraints and substrate damage risks associated with conventional annealing-based stress compensation for large-aperture optical components, we introduce an active stress engineering strategy rooted in in situ deposition process optimization. By systematically tailoring film deposition parameters and adjusting the thickness modulation ratio of TiO2 and SiO2, we achieve dynamic compensation of residual stress in multilayer structures. This approach demonstrates broad applicability across diverse optical coatings, where it effectively mitigates stress-induced surface distortions. Unlike annealing methods, this intrinsic stress polarity manipulation strategy obviates the need for high-temperature post-processing, eliminating risks of material decomposition or substrate degradation. By enabling precise nanoscale stress regulation in large-aperture films through controlled process parameters, it provides essential technical support for manufacturing ultra-precision optical devices, such as next-generation laser systems and space-based stress wave detection instruments, where minimal stress-induced deformation is paramount to functional performance.