Measurement of c-axis Orientation and Residual Stress of AlN Thin Film Produced by Switching-type Planar Magnetron Sputtering Method using X-ray Diffraction Method
Authors
Chang-Suk Han (ORCID: https://orcid.org/0009-0004-4195-6970)
Measurement of c-axis Orientation and Residual Stress of AlN Thin Film Produced by Switching-type Planar Magnetron Sputtering Method using X-ray Diffraction Method
Chang-Suk Han, Tae-Seop Kim, Young-Wook Ko
Journal
Korean Journal of Materials Research
Topics
Acoustic Wave Resonator Technologies
article
Measurement of c-axis Orientation and Residual Stress of AlN Thin Film Produced by Switching-type Planar Magnetron Sputtering Method using X-ray Diffraction Method
Ask Laika to Summarize, Analyze, and Connect papers live on the map.
Summarize Papers & Methodologies
Extract key findings, datasets, and comparative methods across publications.
Benchmark Rankings & Visual Analytics
Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.
Connect Distant Disciplines
Bridge topological clusters on the map to find hidden collaborative intersections.
Measurement of c-axis Orientation and Residual Stress of AlN Thin Film Produced by Switching-type Planar Magnetron Sputtering Method using X-ray Diffraction Method — Chang-Suk Han, Tae-Seop Kim, et al. · Korean Journal of Materials Research (2025) | TGRS Research Map | TGRS