Atomic Force Microscopy Study of the Physical Properties of Aluminum Nitride Thin Films

The results of the measurements of the roughness and longitudinal piezoelectric modulus d33 of aluminum nitride films of different thicknesses obtained by vacuum magnetron sputtering are reported. The characteristics of the synthesized films are described and atomic force microscopy images of the film surface morphology are presented. It is shown that the roughness of the obtained films decreases when a nucleation layer is formed from molybdenum and the piezoelectric moduli d33 of the two materials are similar.

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Publication Details

Journal
Technical Physics Letters
Published
2025-01-01
DOI
https://doi.org/10.1134/s1063785025700129
Primary Topic
Acoustic Wave Resonator Technologies
Type
article
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article

Atomic Force Microscopy Study of the Physical Properties of Aluminum Nitride Thin Films

В. И. Струнин, Л. В. Баранова, N. A. Chirikov, N. A. Davletkildeev et al.
Technical Physics Letters
Acoustic Wave Resonator Technologies
article

Atomic Force Microscopy Study of the Physical Properties of Aluminum Nitride Thin Films

В. И. Струнин, Л. В. Баранова, N. A. Chirikov, N. A. Davletkildeev, A. Yu. Kuklev
article en

Abstract

The results of the measurements of the roughness and longitudinal piezoelectric modulus d33 of aluminum nitride films of different thicknesses obtained by vacuum magnetron sputtering are reported. The characteristics of the synthesized films are described and atomic force microscopy images of the film surface morphology are presented. It is shown that the roughness of the obtained films decreases when a nucleation layer is formed from molybdenum and the piezoelectric moduli d33 of the two materials are similar.

Technical Physics LettersVol. 51(1)
Omsk State University (RU), Siberian Law University (RU), Institute of Radiophysics and Electronics (AM)
Openalex Percentile: Top 84%
Acoustic Wave Resonator Technologies
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