Self-Calibrating TSEP for Junction Temperature and RUL Prediction in GaN HEMTs
Gallium nitride high-electron-mobility transistors (GaN HEMTs) are critical for high-power applications like AI power supplies and robotics but face reliability challenges due to increased dynamic ON-resistance (R<sub>DS_ON</sub>) from electrical and thermomechanical stresses. This paper presents a novel self-calibrating temperature-sensitive electrical parameter (TSEP) model that uses gate leakage current (I<sub>G</sub>) to estimate junction temperature with high accuracy, uniquely addressing aging effects overlooked in prior studies. By integrating I<sub>G</sub>, aging-induced degradation, and failure-in-time (FIT) models, the approach achieves a junction temperature estimation error of less than 1%. Long-term hard-switching tests confirm its effectiveness, with calibrated R<sub>DS_ON</sub> measurements enabling precise remaining useful life (RUL) predictions. This methodology significantly improves GaN HEMT reliability assessment, enhancing their performance in resilient power electronics systems.
Authors
- Yifan Cui
- Chun-Zhang Chen
- Kangyao Wen (ORCID: https://orcid.org/0000-0002-2626-945X)
- Yang Jiang (ORCID: https://orcid.org/0000-0002-5430-2931)
- Qing Wang (ORCID: https://orcid.org/0000-0002-5478-5662)
- Hongyu Yu (ORCID: https://orcid.org/0000-0002-5756-868X)
- Y. Gan (ORCID: https://orcid.org/0000-0001-7126-1820)
Institutions
- Shenzhen Polytechnic University (CN)
- Southern University of Science and Technology (CN)
- Peng Cheng Laboratory (CN)
Publication Details
- Journal
- Nanomaterials
- Published
- 2025-07-16
- DOI
- https://doi.org/10.3390/nano15141102
- Citations
- 1
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 1.26
Funders
- National Natural Science Foundation of China
- Southern University of Science and Technology