Self-Calibrating TSEP for Junction Temperature and RUL Prediction in GaN HEMTs

Gallium nitride high-electron-mobility transistors (GaN HEMTs) are critical for high-power applications like AI power supplies and robotics but face reliability challenges due to increased dynamic ON-resistance (R<sub>DS_ON</sub>) from electrical and thermomechanical stresses. This paper presents a novel self-calibrating temperature-sensitive electrical parameter (TSEP) model that uses gate leakage current (I<sub>G</sub>) to estimate junction temperature with high accuracy, uniquely addressing aging effects overlooked in prior studies. By integrating I<sub>G</sub>, aging-induced degradation, and failure-in-time (FIT) models, the approach achieves a junction temperature estimation error of less than 1%. Long-term hard-switching tests confirm its effectiveness, with calibrated R<sub>DS_ON</sub> measurements enabling precise remaining useful life (RUL) predictions. This methodology significantly improves GaN HEMT reliability assessment, enhancing their performance in resilient power electronics systems.

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Publication Details

Journal
Nanomaterials
Published
2025-07-16
DOI
https://doi.org/10.3390/nano15141102
Citations
1
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
1.26

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article

Self-Calibrating TSEP for Junction Temperature and RUL Prediction in GaN HEMTs

Yifan Cui, Chun-Zhang Chen, Kangyao Wen, Yang Jiang et al.
1 citations
Nanomaterials
GaN-based semiconductor devices and materials
1.26
article

Self-Calibrating TSEP for Junction Temperature and RUL Prediction in GaN HEMTs

Yifan Cui, Chun-Zhang Chen, Kangyao Wen, Yang Jiang, Qing Wang, Hongyu Yu, Y. Gan
article en
1 citations

Abstract

Gallium nitride high-electron-mobility transistors (GaN HEMTs) are critical for high-power applications like AI power supplies and robotics but face reliability challenges due to increased dynamic ON-resistance (R<sub>DS_ON</sub>) from electrical and thermomechanical stresses. This paper presents a novel self-calibrating temperature-sensitive electrical parameter (TSEP) model that uses gate leakage current (I<sub>G</sub>) to estimate junction temperature with high accuracy, uniquely addressing aging effects overlooked in prior studies. By integrating I<sub>G</sub>, aging-induced degradation, and failure-in-time (FIT) models, the approach achieves a junction temperature estimation error of less than 1%. Long-term hard-switching tests confirm its effectiveness, with calibrated R<sub>DS_ON</sub> measurements enabling precise remaining useful life (RUL) predictions. This methodology significantly improves GaN HEMT reliability assessment, enhancing their performance in resilient power electronics systems.

NanomaterialsVol. 15(14)
Shenzhen Polytechnic University (CN), Southern University of Science and Technology (CN), Peng Cheng Laboratory (CN)
National Natural Science Foundation of China, Southern University of Science and Technology
Affordable and clean energy
Openalex Percentile: Top 19%
GaN-based semiconductor devices and materials
1.26
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Self-Calibrating TSEP for Junction Temperature and RUL Prediction in GaN HEMTs — Yifan Cui, Chun-Zhang Chen, et al. · Nanomaterials (2025) | TGRS Research Map | TGRS