Electrothermal co-optimization of 2.5D power distribution network with TTSV cooling

Thermal and power integrity management remains a fundamental challenge in 2.5-dimensional (2.5D) integrated microsystem design. This paper proposes an electrothermal co-optimization design methodology for a 2.5D power distribution network with thermal through silicon via (TTSV) cooling. A hybrid metaheuristic optimization algorithm is presented to optimize the multi-objective function in terms of both the electrothermal properties and manufacturing cost. The proposed approach achieves an optimal solution (minimum fitness value = 310.3) for TTSV scaling and chiplet placement, albeit with increased computational complexity. Compared to the finite element simulation results, the average absolute errors of the impedance and temperature values obtained from the optimization are 3.97% and 0.35%, respectively. The proposed method is effective in enhancing thermal management, satisfying power and signal integrity requirements, and minimizing manufacturing costs.

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Publication Details

Journal
Scientific Reports
Published
2025-07-16
DOI
https://doi.org/10.1038/s41598-025-09914-y
Primary Topic
Electromagnetic Compatibility and Noise Suppression
Type
article
Field-Weighted Citation Impact
0.00

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Electrothermal co-optimization of 2.5D power distribution network with TTSV cooling

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Electromagnetic Compatibility and Noise Suppression
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Electrothermal co-optimization of 2.5D power distribution network with TTSV cooling

Yang Wang, Zhangming Zhu, Changle Zhi, Daihang Liu, Gang Dong, Deguang Yang
article en

Abstract

Thermal and power integrity management remains a fundamental challenge in 2.5-dimensional (2.5D) integrated microsystem design. This paper proposes an electrothermal co-optimization design methodology for a 2.5D power distribution network with thermal through silicon via (TTSV) cooling. A hybrid metaheuristic optimization algorithm is presented to optimize the multi-objective function in terms of both the electrothermal properties and manufacturing cost. The proposed approach achieves an optimal solution (minimum fitness value = 310.3) for TTSV scaling and chiplet placement, albeit with increased computational complexity. Compared to the finite element simulation results, the average absolute errors of the impedance and temperature values obtained from the optimization are 3.97% and 0.35%, respectively. The proposed method is effective in enhancing thermal management, satisfying power and signal integrity requirements, and minimizing manufacturing costs.

Scientific ReportsVol. 15(1)
Xidian University (CN)
National Natural Science Foundation of China
Affordable and clean energy
Openalex Percentile: Top 85%
Electromagnetic Compatibility and Noise Suppression
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