Impact of Deposition Temperature on the Performance of Sputtered SnO ₂ Electron Transport Layer in Perovskite Solar Cells

The drive to commercialize perovskite solar cells (PSCs) requires the development of scalable fabrication techniques. Sputtering, being an industrial technique, offers a promising approach for fabricating SnO 2 electron transport layers (ETLs). This study looks into the effect of deposition temperature in the range of 20–400 °C during sputtering of SnO 2 . The sputtered films are characterized using various optoelectronic techniques such as X‐ray photoelectron spectroscopy, grazing incidence X‐ray diffraction, and Hall effect measurements. Full‐scale device testing demonstrates that a deposition temperature of 100 °C is optimal for achieving peak PSC performance, attributed to enhanced SnO 2 crystallinity, improved FTO, and SnO 2 surface chemistry and low sheet resistivity of the tin oxide films. This study demonstrates the viability of sputtering for ETL fabrication, with the low processing temperature of this technique, making it ideal for commercialization, especially for flexible PSCs.