Substructure of β-SiC Films Synthesized on the Surface of Vacuum and Air Cleavage of Mono-Si

The substructure, orientation, and morphology of thin β-SiC films formed on the surface of a vacuum cleavage (juvenile surface) and an air cleavage (nonjuvenile surface) of a silicon single crystal during carbidization in the process of carbon arc evaporation have been studied by TEM, RHEED, SEM, and AFM methods. The effect of the juvenile surface in the synthesis of β-SiC films on Si is shown, which manifests itself in the fact that the β-SiC phase nucleates uniformly on the juvenile surface, forming a nanocrystalline oriented film at 1123 K; on the nonjuvenile surface, the carbide phase is formed at the points of breakdown of a thin film of natural silicon oxide.

Authors

Institutions

Publication Details

Journal
Surface Engineering and Applied Electrochemistry
Published
2025-05-01
DOI
https://doi.org/10.3103/s1068375525700371
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
0.00
Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Substructure of β-SiC Films Synthesized on the Surface of Vacuum and Air Cleavage of Mono-Si

А. А. Лукин, С. А. Солдатенко, V. O. Tekutyeva
Surface Engineering and Applied Electrochemistry
Silicon Carbide Semiconductor Technologies
article

Substructure of β-SiC Films Synthesized on the Surface of Vacuum and Air Cleavage of Mono-Si

А. А. Лукин, С. А. Солдатенко, V. O. Tekutyeva
article en

Abstract

The substructure, orientation, and morphology of thin β-SiC films formed on the surface of a vacuum cleavage (juvenile surface) and an air cleavage (nonjuvenile surface) of a silicon single crystal during carbidization in the process of carbon arc evaporation have been studied by TEM, RHEED, SEM, and AFM methods. The effect of the juvenile surface in the synthesis of β-SiC films on Si is shown, which manifests itself in the fact that the β-SiC phase nucleates uniformly on the juvenile surface, forming a nanocrystalline oriented film at 1123 K; on the nonjuvenile surface, the carbide phase is formed at the points of breakdown of a thin film of natural silicon oxide.

Surface Engineering and Applied ElectrochemistryVol. 61(3)
Voronezh State Technical University (RU), Air Force Academy named after Professor NE Zhukovsky and Yu.A. Gagarin (RU), Voronezh State University (RU)
Openalex Percentile: Top 85%
Silicon Carbide Semiconductor Technologies
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.