Advantage and Challenge of Electrical Critical Dimension Test Structures for Electroplated High Aspect Ratio Nano Structures (HARNS) on Insulating Materials
Electrical Critical Dimension Test Structures (ECD-TS) have been applied for development of new technology: Metallic High Aspect Ratio Nano Structures (Metal-HARNS). The HARNS refer to electro mechanical structures scaled down to submicron width (as narrow as 260nm confirmed) while keeping its thickness (up to 1500nm confirmed). Two major advantage and challenge have been confirmed through measurement: (1) insulating material showed critical advantage on ECD over Scanning Electron Microscope CD assessment and (2) seed conductive layer affected the measurement as leakage path.
Authors
- Akio Higo (ORCID: https://orcid.org/0000-0002-4595-0929)
- Shun Yasunaga (ORCID: https://orcid.org/0000-0003-0146-5339)
- Yoshio Mita (ORCID: https://orcid.org/0000-0003-3655-1245)
- Etsuko Ohta
- Ayako Mizushima
- Ryosho Nakane (ORCID: https://orcid.org/0000-0002-9059-9349)
- David Bourrier (ORCID: https://orcid.org/0000-0003-0659-1924)
- Hugues Granier
- Yurie Inoue
- Noriko Kawai
- Amel Beghersa
- Tsuboi Shinji
Institutions
- Centre National de la Recherche Scientifique (FR)
- Tokyo University of Information Sciences (JP)
- Laboratoire d'Analyse et d'Architecture des Systèmes (FR)
- Systems Biology Institute (JP)
Publication Details
- Published
- 2025-03-24
- DOI
- https://doi.org/10.1109/icmts63811.2025.11068934
- Citations
- 1
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.73
Funders
- Ministry of Education