A Novel Separated Source Electrodes Kelvin (SSEK) Structure for Extracting Channel Mobility in the 4H-SiC VDMOSFET

A novel Separated Source Electrodes Kelvin (SSEK) structure is proposed to effectively eliminate most of the series resistance in a VDMOSFET, enabling accurate channel mobility extraction. By utilizing the SSEK structure, we can separately measure the resistance of the left and right channels, thereby achieving more precise channel mobility extraction and effectively evaluating process improvements for vertical power MOSFETs.

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Published
2025-03-24
DOI
https://doi.org/10.1109/icmts63811.2025.11068902
Citations
1
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
0.73

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article

A Novel Separated Source Electrodes Kelvin (SSEK) Structure for Extracting Channel Mobility in the 4H-SiC VDMOSFET

Yi‐Kai Hsiao, Bing‐Yue Tsui, Chia-Lung Hung, Wenshu Chen et al.
1 citations
Silicon Carbide Semiconductor Technologies
0.73
article

A Novel Separated Source Electrodes Kelvin (SSEK) Structure for Extracting Channel Mobility in the 4H-SiC VDMOSFET

Yi‐Kai Hsiao, Bing‐Yue Tsui, Chia-Lung Hung, Wenshu Chen, A. Li
article en
1 citations

Abstract

A novel Separated Source Electrodes Kelvin (SSEK) structure is proposed to effectively eliminate most of the series resistance in a VDMOSFET, enabling accurate channel mobility extraction. By utilizing the SSEK structure, we can separately measure the resistance of the left and right channels, thereby achieving more precise channel mobility extraction and effectively evaluating process improvements for vertical power MOSFETs.

National Yang Ming Chiao Tung University (TW)
National Science and Technology Council
Affordable and clean energy
Openalex Percentile: Top 26%
Silicon Carbide Semiconductor Technologies
0.73
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