Modified Angelov Model with Improved Accuracy for RF GaN-on-Si HEMTs

Modified Angelov model with improved accuracy for RF GaN-on-Si HEMTs is proposed and verified. In this work, major model equations for accuracy improvement are analyzed. WTK’s GaN-on-Si GS50 dual-gate RF switch technology is applied for the demonstration of model accuracy with the measurement data of DC I-V, S-parameters (SP), and large-signal (LS). Model and Process Design Kit (PDK) are released for customer design and manufacturing already.

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Publication Details

Published
2025-03-24
DOI
https://doi.org/10.1109/icmts63811.2025.11068906
Primary Topic
GaN-based semiconductor devices and materials
Type
article
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article

Modified Angelov Model with Improved Accuracy for RF GaN-on-Si HEMTs

Tuo‐Hung Hou, David C. Chen, Kevin C. Y. Lee, K. K. Lin et al.
GaN-based semiconductor devices and materials
article

Modified Angelov Model with Improved Accuracy for RF GaN-on-Si HEMTs

Tuo‐Hung Hou, David C. Chen, Kevin C. Y. Lee, K. K. Lin, Barry Lin, Ming‐Chia Lai, M. H. Hsieh, H.C. Lin, P.S.D. Lin, Min Li Chou
article en

Abstract

Modified Angelov model with improved accuracy for RF GaN-on-Si HEMTs is proposed and verified. In this work, major model equations for accuracy improvement are analyzed. WTK’s GaN-on-Si GS50 dual-gate RF switch technology is applied for the demonstration of model accuracy with the measurement data of DC I-V, S-parameters (SP), and large-signal (LS). Model and Process Design Kit (PDK) are released for customer design and manufacturing already.

Novatek Microelectronics (Taiwan) (TW), United Microelectronics (Taiwan) (TW)
Affordable and clean energy
Openalex Percentile: Top 90%
GaN-based semiconductor devices and materials
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