Voltage-tuned polarization control via UV light in BiFeO3 thin film on Nb–SrTiO3

BiFeO3 thin films were grown on Nb-doped SrTiO3 substrates using radio frequency magnetron sputtering and subsequently annealed to enhance their structural and ferroelectric properties. With piezoresponse force microscopy, with a width of ∼500 nm, thin films were successfully created by controlling polarization through direct current poling. Here, we found a significant reduction in polarization amplitude around 81% when the sample was irradiated under ultraviolet (UV). These results highlight the interplay between poling and UV-induced effects, which can control the ferroelectric states. This study will pave the way for promising applications in optoelectronic devices and non-volatile memory technologies.

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Publication Details

Journal
APL Materials
Published
2025-07-01
DOI
https://doi.org/10.1063/5.0278753
Primary Topic
Multiferroics and related materials
Type
article
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Voltage-tuned polarization control via UV light in BiFeO3 thin film on Nb–SrTiO3

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article

Voltage-tuned polarization control via UV light in BiFeO3 thin film on Nb–SrTiO3

Areeya Mooltang, Pattanaphong Janphuang, Manunya Tepakidareekul, Warakorn Jindata, Sorawis Sangtawesin, W. Meevasana, Panithan Sriboriboon, Kriettisak Srisom, Napoom Thooppanom
article en

Abstract

BiFeO3 thin films were grown on Nb-doped SrTiO3 substrates using radio frequency magnetron sputtering and subsequently annealed to enhance their structural and ferroelectric properties. With piezoresponse force microscopy, with a width of ∼500 nm, thin films were successfully created by controlling polarization through direct current poling. Here, we found a significant reduction in polarization amplitude around 81% when the sample was irradiated under ultraviolet (UV). These results highlight the interplay between poling and UV-induced effects, which can control the ferroelectric states. This study will pave the way for promising applications in optoelectronic devices and non-volatile memory technologies.

APL MaterialsVol. 13(7)
Synchrotron Light Research Institute (TH), Suranaree University of Technology (TH)
Openalex Percentile: Top 90%
Multiferroics and related materials
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