Polarization Signal Amplification of 2D GeSe‐Based Polarization‐Sensitive Photodetectors

Polarization-sensitive photodetectors, resolving light intensity, wavelength, and polarization states, enable the characterization of probing microstructure, internal stress, and compositional heterogeneity. Polarizer-free polarization-sensitive photodetectors based on in-plane anisotropic 2D semiconductors offer potential for device miniaturization and on-chip integration, owing to their inherent linear dichroism and orientation-dependent carrier mobilities. Hundreds of in-plane anisotropic 2D materials have been successfully discovered; however, the limited anisotropic photocurrent ratio (PR<10) has hindered the practical application. Herein, a field-effect transistor (FET)-based amplification strategy, enhancing PR from 2.1 to 54.8 in 2D GeSe photodetectors is proposed. This significant PR enhancement arises from polarization-induced resistance variations dynamically modulating gate potentials. Coupled with a steep transistor subthreshold region, small gate fluctuations produce substantial drain current changes, amplifying output anisotropy sensitively. Evaluating four types of FET identifies SMT-Si transistors as optimal due to their high stability, sharp subthreshold, and excellent noise immunity. In addition, the amplified PR signal directly enhances image contrast and recognition accuracy. Notably, with a high-PR signal, the machine learning model achieves a recognition rate of 0.99 in only 17 training epochs, reflecting a computational cost reduction of over 60%. This work provides an effective strategy to enhance PR, benefiting from high-resolution polarization imaging and advanced optoelectronic sensing.

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Publication Details

Journal
Advanced Materials
Published
2025-07-04
DOI
https://doi.org/10.1002/adma.202509066
Citations
9
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
4.66

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article

Polarization Signal Amplification of 2D GeSe‐Based Polarization‐Sensitive Photodetectors

Shujun Qiu, Tingwei Liu, Qianqian Huang, Wenhao Ran et al.
9 citations
Advanced Materials
2D Materials and Applications
4.66
article

Polarization Signal Amplification of 2D GeSe‐Based Polarization‐Sensitive Photodetectors

Shujun Qiu, Tingwei Liu, Qianqian Huang, Wenhao Ran, Ziqi Zhou, Duanyang Liu, Shaodi Xu, Kexin He, Yali Yu, J. Wen, Kaiyao Xin, G. Shen, Zhongming Wei
article en
9 citations

Abstract

Polarization-sensitive photodetectors, resolving light intensity, wavelength, and polarization states, enable the characterization of probing microstructure, internal stress, and compositional heterogeneity. Polarizer-free polarization-sensitive photodetectors based on in-plane anisotropic 2D semiconductors offer potential for device miniaturization and on-chip integration, owing to their inherent linear dichroism and orientation-dependent carrier mobilities. Hundreds of in-plane anisotropic 2D materials have been successfully discovered; however, the limited anisotropic photocurrent ratio (PR<10) has hindered the practical application. Herein, a field-effect transistor (FET)-based amplification strategy, enhancing PR from 2.1 to 54.8 in 2D GeSe photodetectors is proposed. This significant PR enhancement arises from polarization-induced resistance variations dynamically modulating gate potentials. Coupled with a steep transistor subthreshold region, small gate fluctuations produce substantial drain current changes, amplifying output anisotropy sensitively. Evaluating four types of FET identifies SMT-Si transistors as optimal due to their high stability, sharp subthreshold, and excellent noise immunity. In addition, the amplified PR signal directly enhances image contrast and recognition accuracy. Notably, with a high-PR signal, the machine learning model achieves a recognition rate of 0.99 in only 17 training epochs, reflecting a computational cost reduction of over 60%. This work provides an effective strategy to enhance PR, benefiting from high-resolution polarization imaging and advanced optoelectronic sensing.

Advanced MaterialsVol. 37(39)
Beijing Institute of Technology (CN), Chinese Academy of Sciences (CN), Peking University (CN), Institute of Semiconductors (CN), University of Chinese Academy of Sciences (CN)
National Natural Science Foundation of China, Natural Science Foundation of Beijing Municipality, National Key Research and Development Program of China
Openalex Percentile: Top 5%
2D Materials and Applications
4.66
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