Polarization Signal Amplification of 2D GeSe‐Based Polarization‐Sensitive Photodetectors
Polarization-sensitive photodetectors, resolving light intensity, wavelength, and polarization states, enable the characterization of probing microstructure, internal stress, and compositional heterogeneity. Polarizer-free polarization-sensitive photodetectors based on in-plane anisotropic 2D semiconductors offer potential for device miniaturization and on-chip integration, owing to their inherent linear dichroism and orientation-dependent carrier mobilities. Hundreds of in-plane anisotropic 2D materials have been successfully discovered; however, the limited anisotropic photocurrent ratio (PR<10) has hindered the practical application. Herein, a field-effect transistor (FET)-based amplification strategy, enhancing PR from 2.1 to 54.8 in 2D GeSe photodetectors is proposed. This significant PR enhancement arises from polarization-induced resistance variations dynamically modulating gate potentials. Coupled with a steep transistor subthreshold region, small gate fluctuations produce substantial drain current changes, amplifying output anisotropy sensitively. Evaluating four types of FET identifies SMT-Si transistors as optimal due to their high stability, sharp subthreshold, and excellent noise immunity. In addition, the amplified PR signal directly enhances image contrast and recognition accuracy. Notably, with a high-PR signal, the machine learning model achieves a recognition rate of 0.99 in only 17 training epochs, reflecting a computational cost reduction of over 60%. This work provides an effective strategy to enhance PR, benefiting from high-resolution polarization imaging and advanced optoelectronic sensing.
Authors
- Shujun Qiu (ORCID: https://orcid.org/0000-0002-5204-4406)
- Tingwei Liu
- Qianqian Huang (ORCID: https://orcid.org/0000-0002-3714-8581)
- Wenhao Ran
- Ziqi Zhou (ORCID: https://orcid.org/0000-0001-9058-7084)
- Duanyang Liu (ORCID: https://orcid.org/0000-0002-6716-9383)
- Shaodi Xu
- Kexin He (ORCID: https://orcid.org/0009-0009-9722-9613)
- Yali Yu
- J. Wen (ORCID: https://orcid.org/0000-0003-2955-603X)
- Kaiyao Xin (ORCID: https://orcid.org/0009-0001-9834-9619)
- G. Shen
- Zhongming Wei (ORCID: https://orcid.org/0000-0002-6237-0993)
Institutions
- Beijing Institute of Technology (CN)
- Chinese Academy of Sciences (CN)
- Peking University (CN)
- Institute of Semiconductors (CN)
- University of Chinese Academy of Sciences (CN)
Publication Details
- Journal
- Advanced Materials
- Published
- 2025-07-04
- DOI
- https://doi.org/10.1002/adma.202509066
- Citations
- 9
- Primary Topic
- 2D Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 4.66
Funders
- National Natural Science Foundation of China
- Natural Science Foundation of Beijing Municipality
- National Key Research and Development Program of China