Two-Step Photoelectron Lithography for Working with Fragile Nanostructures
An addition to an electron lithograph based on an optical microscope for fast patterning of large-scale elements by the method of contact mask photolithography in ultraviolet radiation on an electronic resistor is presented. The device accelerates the creation of contact pads for solid-state micro- and nanostructures and reduces the risk of sample loss when working with fragile structures.
Authors
- A. Yu. Kuntsevich (ORCID: https://orcid.org/0000-0003-0302-2320)
- Sergey G. Martanov (ORCID: https://orcid.org/0000-0001-7275-4686)
- E. V. Tarkaeva (ORCID: https://orcid.org/0009-0004-1860-0677)
- V. A. Ievleva (ORCID: https://orcid.org/0009-0003-1448-0244)
Institutions
- National Research University Higher School of Economics (RU)
- P.N. Lebedev Physical Institute of the Russian Academy of Sciences (RU)
Publication Details
- Journal
- Instruments and Experimental Techniques
- Published
- 2025-04-01
- DOI
- https://doi.org/10.1134/s0020441225700393
- Primary Topic
- Surface and Thin Film Phenomena
- Type
- article
- Field-Weighted Citation Impact
- 0.00