Investigations on the aging of ZnON thin film transistors and the effect of annealing on device performance

Abstract This study investigates the aging effects of zinc oxynitride (ZnON) thin-film transistors (TFTs) and the effect of annealing under different environments on the device performance. The temporal degradation of these TFTs is attributed to nitrogen desorption and adsorption of ambient species. Analytical characterization of ZnON thin films and DFT simulations reveal that only a weak bond exists between nitrogen and the ZnO matrix, indicative of physisorption rather than strong chemical adsorption. Post-deposition annealing of the devices slows the aging under certain conditions. The device parameter, like field effect mobility, shows nominal improvement due to annealing (2.29 cm 2 V −1 s −1 to 7.39 cm 2 V −1 s −1 ).

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Publication Details

Journal
Materials Research Express
Published
2025-07-01
DOI
https://doi.org/10.1088/2053-1591/adeb48
Primary Topic
Thin-Film Transistor Technologies
Type
article
Field-Weighted Citation Impact
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Investigations on the aging of ZnON thin film transistors and the effect of annealing on device performance

K. Priyanka, P. L. Premlal, Raghu Chatanathodi, Venu Anand et al.
3 links
Materials Research Express
Thin-Film Transistor Technologies
article

Investigations on the aging of ZnON thin film transistors and the effect of annealing on device performance

K. Priyanka, P. L. Premlal, Raghu Chatanathodi, Venu Anand, V. Vidhya
article en

Abstract

Abstract This study investigates the aging effects of zinc oxynitride (ZnON) thin-film transistors (TFTs) and the effect of annealing under different environments on the device performance. The temporal degradation of these TFTs is attributed to nitrogen desorption and adsorption of ambient species. Analytical characterization of ZnON thin films and DFT simulations reveal that only a weak bond exists between nitrogen and the ZnO matrix, indicative of physisorption rather than strong chemical adsorption. Post-deposition annealing of the devices slows the aging under certain conditions. The device parameter, like field effect mobility, shows nominal improvement due to annealing (2.29 cm 2 V −1 s −1 to 7.39 cm 2 V −1 s −1 ).

Materials Research ExpressVol. 12(7)
National Institute of Technology Calicut (IN)
Openalex Percentile: Top 86%
Thin-Film Transistor Technologies
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