Repetition Frequency-Dependent Formation of Oxidized LIPSSs on Amorphous Silicon Films

Laser-induced periodic surface structures (LIPSSs) produced via ultrafast laser-induced oxidation offer a promising route for high-quality nanostructuring, with reduced thermal damage compared to conventional ablation-based methods. However, the influence of laser repetition frequency on the formation and morphology of oxidized LIPSSs remains insufficiently explored. In this study, we systematically investigate the effects of varying the femtosecond laser repetition frequency from 1 kHz to 100 kHz while keeping the total pulse number constant on the oxidation-induced LIPSSs formed on amorphous silicon films. Scanning electron microscopy and Fourier analysis reveal a transition between two morphological regimes with increasing repetition frequency: at low frequencies, the long inter-pulse intervals result in irregular, disordered oxidation patterns; at high frequencies, closely spaced pulses promote the formation of highly ordered, periodic surface structures. Statistical measurements show that the laser-modified area decreases with frequency, while the LIPSS period remains relatively stable and the ridge width exhibits a peak at 10 kHz. Finite-difference time-domain (FDTD) and finite-element simulations suggest that the observed patterns result from a dynamic balance between light-field modulation and oxidation kinetics, rather than thermal accumulation. These findings advance the understanding of oxidation-driven LIPSS formation dynamics and provide guidance for optimizing femtosecond laser parameters for precise surface nanopatterning.