Modelling and Design of Short Channel Ferroelectric FETs with a Metal Interlayer Easing the Multilevel Operation

This work presents a simulation study of a ferroelectric field effect transistor (FeFET), which leverages a metal interlayer to achieve a multilevel operation thanks to the interplay between the ferroelectric polarization and the charge stored in the interlayer. We show that the metal interlayer can effectively stabilize the ferroelectric polarization even for a negligible charge trapping in the dielectric stack and, moreover, enable a multilevel operation even for a uniform ferroelectric polarization.

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Published
2025-03-09
DOI
https://doi.org/10.1109/edtm61175.2025.11040846
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
Field-Weighted Citation Impact
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article

Modelling and Design of Short Channel Ferroelectric FETs with a Metal Interlayer Easing the Multilevel Operation

David Esseni, Daniel Lizzit, Chiara Rossi
Ferroelectric and Negative Capacitance Devices
article

Modelling and Design of Short Channel Ferroelectric FETs with a Metal Interlayer Easing the Multilevel Operation

David Esseni, Daniel Lizzit, Chiara Rossi
article en

Abstract

This work presents a simulation study of a ferroelectric field effect transistor (FeFET), which leverages a metal interlayer to achieve a multilevel operation thanks to the interplay between the ferroelectric polarization and the charge stored in the interlayer. We show that the metal interlayer can effectively stabilize the ferroelectric polarization even for a negligible charge trapping in the dielectric stack and, moreover, enable a multilevel operation even for a uniform ferroelectric polarization.

University of Udine (IT)
H2020 Marie Skłodowska-Curie Actions
Openalex Percentile: Top 87%
Ferroelectric and Negative Capacitance Devices
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