Ferroelectric 3D NAND Storage (Invited)
In this work, we report a multi-pronged optimization of band engineered ferroelectric field effect transistors with dielectric inserts for NAND solutions for in-storage compute applications: (1) design space exploration for optimizing memory window (MW) and (2) retention alongside (3) a novel disturb mitigation scheme to reduce pass disturb. The optimized device is then leveraged to demonstrate a high density in-storage compute solution for protein identification using open modification search.
Authors
- Prasanna Venkatesan Ravindran (ORCID: https://orcid.org/0000-0002-0309-0617)
- Asif Islam Khan (ORCID: https://orcid.org/0000-0003-4369-106X)
Institutions
- Georgia Institute of Technology (US)
Publication Details
- Published
- 2025-03-09
- DOI
- https://doi.org/10.1109/edtm61175.2025.11041675
- Primary Topic
- Ferroelectric and Negative Capacitance Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00