The Demonstration of Scalable-HZO/ZrO2 FeFET With Large Memory Window of 2.3V for 3Bit-Per-Cell, Immediate Read After Write, High Endurance of 10<sup>9</sup> Cycles, and the High Accuracy of 92% for Machine Learning
In this study, we show that using <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\text{HZO} / \text{ZrO}_{2}$</tex> as a ferroelectric layer in FeFETs outperforms HZO alone. The thick HZO layer forms a low-defect-density <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\text{ZrO}_{2}$</tex> layer, enhancing the ON/OFF ratio, memory window, and reducing leakage. Interface defects for the <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$5 / 3(5 ~\text{nm} / 3 ~\text{nm})$</tex>, <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$7 / 3(7 ~\text{nm} / 3 ~\text{nm})$</tex>, and <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$9 / 3(9 ~\text{nm} / 3 ~\text{nm})$</tex> structures were analyzed, revealing optimal performance at <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$9 / 3$</tex> due to uniform domain growth and low defect density. The <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$9 / 3$</tex> structure achieved faster polarization switching and high write speed. Despite a smaller ON/OFF ratio, it exhibited excellent Gmax/Gmin linearity, crucial for neural networks. Machine learning tests demonstrated 92 % accuracy in 20 epochs, highlighting its AI application potential.
Authors
- Ying–Tsan Tang (ORCID: https://orcid.org/0000-0002-3017-8083)
- Hui Chen (ORCID: https://orcid.org/0000-0001-9326-6649)
- Yu‐Ting Tsai (ORCID: https://orcid.org/0000-0002-3397-9353)
- C. S. Pai
- S.-T. Huang
Institutions
- National Central University (TW)
Publication Details
- Published
- 2025-03-09
- DOI
- https://doi.org/10.1109/edtm61175.2025.11041278
- Primary Topic
- Ferroelectric and Negative Capacitance Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00