The Demonstration of Scalable-HZO/ZrO2 FeFET With Large Memory Window of 2.3V for 3Bit-Per-Cell, Immediate Read After Write, High Endurance of 10<sup>9</sup> Cycles, and the High Accuracy of 92% for Machine Learning

In this study, we show that using <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\text{HZO} / \text{ZrO}_{2}$</tex> as a ferroelectric layer in FeFETs outperforms HZO alone. The thick HZO layer forms a low-defect-density <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\text{ZrO}_{2}$</tex> layer, enhancing the ON/OFF ratio, memory window, and reducing leakage. Interface defects for the <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$5 / 3(5 ~\text{nm} / 3 ~\text{nm})$</tex>, <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$7 / 3(7 ~\text{nm} / 3 ~\text{nm})$</tex>, and <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$9 / 3(9 ~\text{nm} / 3 ~\text{nm})$</tex> structures were analyzed, revealing optimal performance at <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$9 / 3$</tex> due to uniform domain growth and low defect density. The <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$9 / 3$</tex> structure achieved faster polarization switching and high write speed. Despite a smaller ON/OFF ratio, it exhibited excellent Gmax/Gmin linearity, crucial for neural networks. Machine learning tests demonstrated 92 % accuracy in 20 epochs, highlighting its AI application potential.

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Published
2025-03-09
DOI
https://doi.org/10.1109/edtm61175.2025.11041278
Primary Topic
Ferroelectric and Negative Capacitance Devices
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article
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article

The Demonstration of Scalable-HZO/ZrO2 FeFET With Large Memory Window of 2.3V for 3Bit-Per-Cell, Immediate Read After Write, High Endurance of 109 Cycles, and the High Accuracy of 92% for Machine Learning

Ying–Tsan Tang, Hui Chen, Yu‐Ting Tsai, C. S. Pai et al.
Ferroelectric and Negative Capacitance Devices
article

The Demonstration of Scalable-HZO/ZrO2 FeFET With Large Memory Window of 2.3V for 3Bit-Per-Cell, Immediate Read After Write, High Endurance of 109 Cycles, and the High Accuracy of 92% for Machine Learning

Ying–Tsan Tang, Hui Chen, Yu‐Ting Tsai, C. S. Pai, S.-T. Huang
article en

Abstract

In this study, we show that using <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\text{HZO} / \text{ZrO}_{2}$</tex> as a ferroelectric layer in FeFETs outperforms HZO alone. The thick HZO layer forms a low-defect-density <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\text{ZrO}_{2}$</tex> layer, enhancing the ON/OFF ratio, memory window, and reducing leakage. Interface defects for the <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$5 / 3(5 ~\text{nm} / 3 ~\text{nm})$</tex>, <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$7 / 3(7 ~\text{nm} / 3 ~\text{nm})$</tex>, and <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$9 / 3(9 ~\text{nm} / 3 ~\text{nm})$</tex> structures were analyzed, revealing optimal performance at <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$9 / 3$</tex> due to uniform domain growth and low defect density. The <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$9 / 3$</tex> structure achieved faster polarization switching and high write speed. Despite a smaller ON/OFF ratio, it exhibited excellent Gmax/Gmin linearity, crucial for neural networks. Machine learning tests demonstrated 92 % accuracy in 20 epochs, highlighting its AI application potential.

National Central University (TW)
Openalex Percentile: Top 87%
Ferroelectric and Negative Capacitance Devices
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