Novel Quasi-Unipolar MOS Pinch-Off Device With Zero-Biased BJT and Its Experiments

A novel quasi-unipolar MOS pinch-off device (MPD) is proposed and experimentally demonstrated in this letter. The MPD integrates a collector-junction zero-biased bipolar junction transistor (z-BJT) and a MOS pinch-off structure. The MOS pinch-off mechanism alleviates the inherent trade-off in conventional JFET where the necessity to sacrifice current capability to reduce the pinch-off voltage <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</sub>, and a 70% increase in current at the same <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</sub> is facilitated. The z-BJT eliminates hole injection into the P-sub, enabling the MPD to operate in a unipolar mode except for the base region of the BJT. This quasi-unipolar mode leads to a reduced P-sub leakage current by more than 3 orders of magnitude compared to that of conventional high-voltage diode. The MPD has been fabricated on a high voltage Bipolar-CMOS-DMOS (BCD) process platform. Experiments demonstrated that the MPD exhibits a breakdown voltage <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">B</sub> of 832 V, a <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</sub> of 20 V, an on-state current exceeding 40 mA, and an off-state substrate leakage current of less than 10 nA. This device has successfully entered large-scale mass production.

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Journal
IEEE Electron Device Letters
Published
2025-06-30
DOI
https://doi.org/10.1109/led.2025.3584042
Primary Topic
Advancements in Semiconductor Devices and Circuit Design
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article
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article

Novel Quasi-Unipolar MOS Pinch-Off Device With Zero-Biased BJT and Its Experiments

Ming Qiao, Yuheng Yao, Zhaoji Li, Nailong He et al.
IEEE Electron Device Letters
Advancements in Semiconductor Devices and Circuit Design
article

Novel Quasi-Unipolar MOS Pinch-Off Device With Zero-Biased BJT and Its Experiments

Ming Qiao, Yuheng Yao, Zhaoji Li, Nailong He, Qiyi Wu, Bo Zhang, Sen Zhang, Teng Liu, Wentong Zhang, Shixiong Chong, Yongyu Shi, Lihui Gu, Guoliang Yao
article en

Abstract

A novel quasi-unipolar MOS pinch-off device (MPD) is proposed and experimentally demonstrated in this letter. The MPD integrates a collector-junction zero-biased bipolar junction transistor (z-BJT) and a MOS pinch-off structure. The MOS pinch-off mechanism alleviates the inherent trade-off in conventional JFET where the necessity to sacrifice current capability to reduce the pinch-off voltage <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</sub>, and a 70% increase in current at the same <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</sub> is facilitated. The z-BJT eliminates hole injection into the P-sub, enabling the MPD to operate in a unipolar mode except for the base region of the BJT. This quasi-unipolar mode leads to a reduced P-sub leakage current by more than 3 orders of magnitude compared to that of conventional high-voltage diode. The MPD has been fabricated on a high voltage Bipolar-CMOS-DMOS (BCD) process platform. Experiments demonstrated that the MPD exhibits a breakdown voltage <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">B</sub> of 832 V, a <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</sub> of 20 V, an on-state current exceeding 40 mA, and an off-state substrate leakage current of less than 10 nA. This device has successfully entered large-scale mass production.

IEEE Electron Device LettersVol. 46(9)
University of Electronic Science and Technology of China (CN), National Engineering Research Center of Electromagnetic Radiation Control Materials (CN)
Openalex Percentile: Top 87%
Advancements in Semiconductor Devices and Circuit Design
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