High-Performance 2D Fets With Single-Crystal Anatase TiO<sub>2</sub> High-$\kappa$ Dielectric

Several bottlenecks must be resolved before two-dimensional (2D) materials-based transistors can be adopted for advanced electronics, particularly the challenge of coupling high- <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\kappa$</tex> dielectrics with 2D semiconductors without adverse effects and continuing to scale their capacitance equivalent thickness (CET). In this work, we have developed a novel single-crystal dielectric and a corresponding integration approach to achieve 2D MoS<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> field-effect transistors (FETs) with outstanding performance, including steep SS (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\sim 68 \text{mV} /$</tex> dec) and high ON/OFF ratio (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$&gt;10^{7}$</tex>).

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Publication Details

Published
2025-03-09
DOI
https://doi.org/10.1109/edtm61175.2025.11040756
Primary Topic
Semiconductor materials and devices
Type
article
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article

High-Performance 2D Fets With Single-Crystal Anatase TiO2 High-$\kappa$ Dielectric

Kah‐Wee Ang, Dong‐Keun Ki, Ji Zhang, Yi Wan et al.
Semiconductor materials and devices
article

High-Performance 2D Fets With Single-Crystal Anatase TiO2 High-$\kappa$ Dielectric

Kah‐Wee Ang, Dong‐Keun Ki, Ji Zhang, Yi Wan, Sean Li, Fangyuan Zheng, Yu‐Ming Chang, Lain‐Jong Li, Jianjun Liu, Chenyang Li, Jing‐Kai Huang, Yang Ni, Lingqi Li
article en

Abstract

Several bottlenecks must be resolved before two-dimensional (2D) materials-based transistors can be adopted for advanced electronics, particularly the challenge of coupling high- <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\kappa$</tex> dielectrics with 2D semiconductors without adverse effects and continuing to scale their capacitance equivalent thickness (CET). In this work, we have developed a novel single-crystal dielectric and a corresponding integration approach to achieve 2D MoS<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> field-effect transistors (FETs) with outstanding performance, including steep SS (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\sim 68 \text{mV} /$</tex> dec) and high ON/OFF ratio (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$&gt;10^{7}$</tex>).

National University of Singapore (SG), City University of Hong Kong (HK), Hong Kong University of Science and Technology (HK), UNSW Sydney (AU), University of Hong Kong (HK)
Openalex Percentile: Top 87%
Semiconductor materials and devices
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