High-Performance 2D Fets With Single-Crystal Anatase TiO<sub>2</sub> High-$\kappa$ Dielectric
Several bottlenecks must be resolved before two-dimensional (2D) materials-based transistors can be adopted for advanced electronics, particularly the challenge of coupling high- <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\kappa$</tex> dielectrics with 2D semiconductors without adverse effects and continuing to scale their capacitance equivalent thickness (CET). In this work, we have developed a novel single-crystal dielectric and a corresponding integration approach to achieve 2D MoS<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> field-effect transistors (FETs) with outstanding performance, including steep SS (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\sim 68 \text{mV} /$</tex> dec) and high ON/OFF ratio (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$>10^{7}$</tex>).
Authors
- Kah‐Wee Ang (ORCID: https://orcid.org/0000-0003-1919-3351)
- Dong‐Keun Ki (ORCID: https://orcid.org/0000-0002-4638-2038)
- Ji Zhang (ORCID: https://orcid.org/0000-0002-9976-5948)
- Yi Wan (ORCID: https://orcid.org/0000-0002-6202-4193)
- Sean Li (ORCID: https://orcid.org/0000-0003-4437-8817)
- Fangyuan Zheng (ORCID: https://orcid.org/0000-0001-9939-8087)
- Yu‐Ming Chang (ORCID: https://orcid.org/0000-0002-8078-9181)
- Lain‐Jong Li (ORCID: https://orcid.org/0000-0002-4059-7783)
- Jianjun Liu (ORCID: https://orcid.org/0000-0002-3255-3019)
- Chenyang Li (ORCID: https://orcid.org/0000-0002-5155-4631)
- Jing‐Kai Huang (ORCID: https://orcid.org/0000-0002-7187-2653)
- Yang Ni (ORCID: https://orcid.org/0000-0002-9678-6997)
- Lingqi Li (ORCID: https://orcid.org/0000-0001-5517-0734)
Institutions
- National University of Singapore (SG)
- City University of Hong Kong (HK)
- Hong Kong University of Science and Technology (HK)
- UNSW Sydney (AU)
- University of Hong Kong (HK)
Publication Details
- Published
- 2025-03-09
- DOI
- https://doi.org/10.1109/edtm61175.2025.11040756
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00