A Silicon Resonant Type Ceramic Pressure Sensor with Minimal Effect of Ambient Temperature

This paper proposes a silicon resonant type ceramic pressure sensor with a minimal effect of ambient temperature. A static force driven silicon resonant sensor chip, which enables high accuracy, excellent repeatability, and long-term stability, is directly bonded on a silicon nitride (Si3N4) diaphragm by surface activated bonding. To minimize the thermal strain induced by the difference of coefficient of thermal expansion between silicon and Si3N4, a temperature compensation was achieved by designing a round-shape bonding area on the chip and by tuning thickness ratio of the chip and the diaphragm. As a result, it is confirmed that the thermal strain of the silicon resonator (-0.013 µε/°C) was much smaller than the pressure strain (46 µε/MPa), which corresponds to simulation results.

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Publication Details

Journal
IEEJ Transactions on Sensors and Micromachines
Published
2025-06-30
DOI
https://doi.org/10.1541/ieejsmas.145.138
Primary Topic
Advanced MEMS and NEMS Technologies
Type
article
Field-Weighted Citation Impact
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article

A Silicon Resonant Type Ceramic Pressure Sensor with Minimal Effect of Ambient Temperature

Ryosuke Kaneko, Shuhei Yoshita, Takashi Yoshida, Toru Hirayama et al.
IEEJ Transactions on Sensors and Micromachines
Advanced MEMS and NEMS Technologies
article

A Silicon Resonant Type Ceramic Pressure Sensor with Minimal Effect of Ambient Temperature

Ryosuke Kaneko, Shuhei Yoshita, Takashi Yoshida, Toru Hirayama, Nobuyuki Hamamatsu
article en

Abstract

This paper proposes a silicon resonant type ceramic pressure sensor with a minimal effect of ambient temperature. A static force driven silicon resonant sensor chip, which enables high accuracy, excellent repeatability, and long-term stability, is directly bonded on a silicon nitride (Si3N4) diaphragm by surface activated bonding. To minimize the thermal strain induced by the difference of coefficient of thermal expansion between silicon and Si3N4, a temperature compensation was achieved by designing a round-shape bonding area on the chip and by tuning thickness ratio of the chip and the diaphragm. As a result, it is confirmed that the thermal strain of the silicon resonator (-0.013 µε/°C) was much smaller than the pressure strain (46 µε/MPa), which corresponds to simulation results.

IEEJ Transactions on Sensors and MicromachinesVol. 145(7)
Yokogawa Electric (Japan) (JP)
Affordable and clean energy
Openalex Percentile: Top 87%
Advanced MEMS and NEMS Technologies
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