Stable polysiloxane resins for silicon-containing anti-reflective coatings

Silicon-containing anti-reflective coating (SiARC) resins are commonly prepared through the sol-gel method. Owing to the high concentration of hydroxyl groups (─OH) in its molecular structure, SiARC is prone to self-polymerization during storage leading to poor storage stability. The resin of SiARC without the Si─OH group was obtained through the molecular modification of polymethylsiloxane (PMHS). A series of chain pollysioxanes were synthesized by incorporating carbon–carbon double-bond monomers, which contain both cross-linking and light-absorbing functional groups on polymethylhydrosiloxane chains. The proportions of different cross-linking and light-absorbing groups were studied for an effective regulation of the optical parameters (n and k values) at 193 nm and the etching rate of fluorine ion and oxygen ion. We provided a new method for the design of SiARCs with long shelf time.