Enhancing AEMEC Performance via Anode GDL Wettability Control

Establishing a three-dimensional (3D) model of an AEM single-channel electrolysis cell, this study investigates the role of anode gas diffusion layer (GDL) wettability in AEMEC performance. A strong correlation between hydrophilicity and reduced contact angles at the GDL interface was identified, which promotes bubble departure and transport. Lower contact angles enhance liquid water saturation in the AEMEC fluid, particularly under high-potential conditions, thereby increasing AEM hydration, membrane conductivity, and catalyst utilization while reducing ohmic overpotential and mass-transport overvoltage. Within an optimal range, contact angle minimization synergistically decreases energy consumption, providing a theoretical framework for AEMEC optimization.

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Publication Details

Published
2025-04-25
DOI
https://doi.org/10.1109/nesp65198.2025.11041499
Primary Topic
Semiconductor materials and devices
Type
article
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article

Enhancing AEMEC Performance via Anode GDL Wettability Control

Yueting Sun, Lingjun Song, Yuwei Song
Semiconductor materials and devices
article

Enhancing AEMEC Performance via Anode GDL Wettability Control

Yueting Sun, Lingjun Song, Yuwei Song
article en

Abstract

Establishing a three-dimensional (3D) model of an AEM single-channel electrolysis cell, this study investigates the role of anode gas diffusion layer (GDL) wettability in AEMEC performance. A strong correlation between hydrophilicity and reduced contact angles at the GDL interface was identified, which promotes bubble departure and transport. Lower contact angles enhance liquid water saturation in the AEMEC fluid, particularly under high-potential conditions, thereby increasing AEM hydration, membrane conductivity, and catalyst utilization while reducing ohmic overpotential and mass-transport overvoltage. Within an optimal range, contact angle minimization synergistically decreases energy consumption, providing a theoretical framework for AEMEC optimization.

Beihang University (CN)
Openalex Percentile: Top 87%
Semiconductor materials and devices
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