Live Demonstration: N2 Nanosheet Pathfinding-PDK

CMOS scaling involves more than just reducing the effective channel length—it has become increasingly complex. Aligning the circuit design ecosystem with semiconductor technology is now more critical than ever, giving rise to the Design-Technology Co-Optimization (DTCO) concept and further extending Moore’s Law. This live demonstration presents our previously published N2 nanosheet Pathfinding PDK (P-PDK) which provides insight into cutting-edge CMOS technology under the framework of DTCO. This session will cover the motivation behind developing this cutting-edge PDK, the basic flow of using the P-PDK, and the prospects of the P-PDK.

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Publication Details

Published
2025-05-25
DOI
https://doi.org/10.1109/iscas56072.2025.11044114
Primary Topic
Nanofabrication and Lithography Techniques
Type
article
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Live Demonstration: N2 Nanosheet Pathfinding-PDK

Anita Farokhnejad, Chaohan Wang, M. Garcia Bardon, Julien Ryckaert et al.
Nanofabrication and Lithography Techniques
article

Live Demonstration: N2 Nanosheet Pathfinding-PDK

Anita Farokhnejad, Chaohan Wang, M. Garcia Bardon, Julien Ryckaert, Jack Cousins
article en

Abstract

CMOS scaling involves more than just reducing the effective channel length—it has become increasingly complex. Aligning the circuit design ecosystem with semiconductor technology is now more critical than ever, giving rise to the Design-Technology Co-Optimization (DTCO) concept and further extending Moore’s Law. This live demonstration presents our previously published N2 nanosheet Pathfinding PDK (P-PDK) which provides insight into cutting-edge CMOS technology under the framework of DTCO. This session will cover the motivation behind developing this cutting-edge PDK, the basic flow of using the P-PDK, and the prospects of the P-PDK.

IMEC (BE), Integrated Medicines (United Kingdom) (GB)
Openalex Percentile: Top 86%
Nanofabrication and Lithography Techniques
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