3D SRAM Disaggregation in Advanced CMOS Nodes using Hybrid Bonding Technology

This paper studies the potential of hybrid bonded Array-under-CMOS (AuC) technology to partition logic and high-performance L1 cache in advanced technology nodes. By decoupling the SRAM bitcells from the logic tier, we achieve independent optimization of both SRAM and logic devices, as well as back-end-of-line (BEOL) interconnects. Heterogeneous integration and BEOL aspect ratio optimization is implemented with different technology nodes to mitigate the delay penalty due to hybrid bond pad staggering. Addressing the performance degradation associated with scaled technology nodes, we investigate the impact of word-line (WL) and bit-line (BL) resistance on SRAM performance. Leveraging the flexibility of decoupled SRAM BEOL and within the AuC technology framework, we explore the sensitivity to WL and BL metal aspect ratios, comparing their performance against a 2D baseline. Our results demonstrate substantial performance improvements in AuC integration through two key approaches: (1) 5% enhancement via Back-End-of-Line (BEOL) optimization, and (2) 25% improvement enabled by heterogeneous integration, achieved by decoupling memory and logic tiers.

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Published
2025-05-25
DOI
https://doi.org/10.1109/iscas56072.2025.11043974
Primary Topic
Integrated Circuits and Semiconductor Failure Analysis
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article
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article

3D SRAM Disaggregation in Advanced CMOS Nodes using Hybrid Bonding Technology

Jaydeep P. Kulkarni, Dawit Burusie Abdi, Fernando Garćıa-Redondo, Dwaipayan Biswas et al.
Integrated Circuits and Semiconductor Failure Analysis
article

3D SRAM Disaggregation in Advanced CMOS Nodes using Hybrid Bonding Technology

Jaydeep P. Kulkarni, Dawit Burusie Abdi, Fernando Garćıa-Redondo, Dwaipayan Biswas, Bhawana Kumari, Anurag Swarnkar, Julien Ryckaert, James Myers
article en

Abstract

This paper studies the potential of hybrid bonded Array-under-CMOS (AuC) technology to partition logic and high-performance L1 cache in advanced technology nodes. By decoupling the SRAM bitcells from the logic tier, we achieve independent optimization of both SRAM and logic devices, as well as back-end-of-line (BEOL) interconnects. Heterogeneous integration and BEOL aspect ratio optimization is implemented with different technology nodes to mitigate the delay penalty due to hybrid bond pad staggering. Addressing the performance degradation associated with scaled technology nodes, we investigate the impact of word-line (WL) and bit-line (BL) resistance on SRAM performance. Leveraging the flexibility of decoupled SRAM BEOL and within the AuC technology framework, we explore the sensitivity to WL and BL metal aspect ratios, comparing their performance against a 2D baseline. Our results demonstrate substantial performance improvements in AuC integration through two key approaches: (1) 5% enhancement via Back-End-of-Line (BEOL) optimization, and (2) 25% improvement enabled by heterogeneous integration, achieved by decoupling memory and logic tiers.

IMEC (BE), Integrated Medicines (United Kingdom) (GB)
Openalex Percentile: Top 87%
Integrated Circuits and Semiconductor Failure Analysis
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