Spontaneous localization of microspheres within drying droplets on wetting patterned substrates

Abstract During the drying of droplets containing microspheres (MSs), the coffee ring effect drives flow from the droplet’s center toward the contact line. Consequently, MSs form a circular deposit near the contact line after drying. Herein, we fixed the contact line using a triangular wetting patterned (WP) substrate. We investigated the flow field within droplets during drying and the resulting distribution of MSs. Our findings revealed that flow toward the tip of the triangular WP was faster than that toward the base. This asymmetric flow led to the spontaneous localization of MSs around the tip of the triangular WP during drying.

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Publication Details

Journal
Japanese Journal of Applied Physics
Published
2025-06-27
DOI
https://doi.org/10.35848/1347-4065/ade923
Primary Topic
Nanomaterials and Printing Technologies
Type
article
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article

Spontaneous localization of microspheres within drying droplets on wetting patterned substrates

Mary-Jo Weir Weiss, Boris Stoeber, Satoshi Konishi, Shinji Bono
Japanese Journal of Applied Physics
Nanomaterials and Printing Technologies
article

Spontaneous localization of microspheres within drying droplets on wetting patterned substrates

Mary-Jo Weir Weiss, Boris Stoeber, Satoshi Konishi, Shinji Bono
article en

Abstract

Abstract During the drying of droplets containing microspheres (MSs), the coffee ring effect drives flow from the droplet’s center toward the contact line. Consequently, MSs form a circular deposit near the contact line after drying. Herein, we fixed the contact line using a triangular wetting patterned (WP) substrate. We investigated the flow field within droplets during drying and the resulting distribution of MSs. Our findings revealed that flow toward the tip of the triangular WP was faster than that toward the base. This asymmetric flow led to the spontaneous localization of MSs around the tip of the triangular WP during drying.

Japanese Journal of Applied PhysicsVol. 64(7)
Ritsumeikan University (JP), University of British Columbia (CA), Ritsumeikan Junior and Senior High School (JP)
Openalex Percentile: Top 87%
Nanomaterials and Printing Technologies
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Spontaneous localization of microspheres within drying droplets on wetting patterned substrates — Mary-Jo Weir Weiss, Boris Stoeber, et al. · Japanese Journal of Applied Physics (2025) | TGRS Research Map | TGRS