Maskless soft lithography for fabricating micro- and nano-scale Ag structures <i>via</i> solid-state electrochemical etching using a polymer electrolyte membrane for optoelectronic and sensing applications
A rapid, room-temperature solid-state electrolysis method enables direct Ag patterning at micro- and nano-scales, enhancing optical transparency and SERS sensitivity for flexible optoelectronic and sensing applications.
Authors
- Junji Murata (ORCID: https://orcid.org/0000-0001-7812-8889)
- Atsuki Tsuji
- Tatsuya Fujii (ORCID: https://orcid.org/0000-0001-5830-0485)
- Masaru Takizawa
- Daishi Hakozaki
Institutions
- Ritsumeikan University (JP)
Publication Details
- Journal
- Materials Advances
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d5ma00218d
- Citations
- 2
- Primary Topic
- Nanofabrication and Lithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 1.35
Funders
- Japan Society for the Promotion of Science