Effects on Circular Enclosed Gate Device with Base Model and Varying Geometry Condition and Parameters
Study aims at devising a enhance performance driven Circular Enclosed Gate (CEG) MOSFET’s from Model 1 to Model 3, with focus on maintaining power efficiency. Starting with Model 1, subsequent iteration introduced the optimized geometric structure addressing trade-offs in short channel effects, leakage currents, and switching speed, while balancing design and low threshold voltages (V<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</inf>: 0.13 V for NMOS, 0.1 V for PMOS). In Model 2(a), improved performance was seen with increase in drain radius, which enhancing the I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">ON</inf>/I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">OFF</inf> ratio. In contrast Model 2(b) demonstrated a better overall efficiency, by optimizing the source-drain geometry for lower Drain-Induced Barrier Lowering (DIBL) and improved subthreshold slopes. Meanwhile with compact design Model 3 achieves an impressive I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">ON</inf>/I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">OFF</inf> ratio of 1.15×10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">9</sup>, and exceptionally low leakage currents (I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">OFF</inf>: 1.40×10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">−12</sup> A for NMoS) making it highly suitable for energy-efficient and reliable applications. This step-by-step refinement underscores the potential for continuous advancements in CEG MoSFETs, driving the evolution of next-generation CMoS technology.
Authors
- Vandana Verma (ORCID: https://orcid.org/0000-0002-1316-5176)
- Arvind Kumar (ORCID: https://orcid.org/0000-0003-0202-5335)
- Raj Kumar
Institutions
- Panjab University (IN)
Publication Details
- Published
- 2025-03-06
- DOI
- https://doi.org/10.1109/ispcc66872.2025.11039533
- Primary Topic
- Advanced Surface Polishing Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00