Effects on Circular Enclosed Gate Device with Base Model and Varying Geometry Condition and Parameters

Study aims at devising a enhance performance driven Circular Enclosed Gate (CEG) MOSFET’s from Model 1 to Model 3, with focus on maintaining power efficiency. Starting with Model 1, subsequent iteration introduced the optimized geometric structure addressing trade-offs in short channel effects, leakage currents, and switching speed, while balancing design and low threshold voltages (V<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</inf>: 0.13 V for NMOS, 0.1 V for PMOS). In Model 2(a), improved performance was seen with increase in drain radius, which enhancing the I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">ON</inf>/I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">OFF</inf> ratio. In contrast Model 2(b) demonstrated a better overall efficiency, by optimizing the source-drain geometry for lower Drain-Induced Barrier Lowering (DIBL) and improved subthreshold slopes. Meanwhile with compact design Model 3 achieves an impressive I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">ON</inf>/I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">OFF</inf> ratio of 1.15×10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">9</sup>, and exceptionally low leakage currents (I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">OFF</inf>: 1.40×10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">−12</sup> A for NMoS) making it highly suitable for energy-efficient and reliable applications. This step-by-step refinement underscores the potential for continuous advancements in CEG MoSFETs, driving the evolution of next-generation CMoS technology.

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Published
2025-03-06
DOI
https://doi.org/10.1109/ispcc66872.2025.11039533
Primary Topic
Advanced Surface Polishing Techniques
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article
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article

Effects on Circular Enclosed Gate Device with Base Model and Varying Geometry Condition and Parameters

Vandana Verma, Arvind Kumar, Raj Kumar
Advanced Surface Polishing Techniques
article

Effects on Circular Enclosed Gate Device with Base Model and Varying Geometry Condition and Parameters

Vandana Verma, Arvind Kumar, Raj Kumar
article en

Abstract

Study aims at devising a enhance performance driven Circular Enclosed Gate (CEG) MOSFET’s from Model 1 to Model 3, with focus on maintaining power efficiency. Starting with Model 1, subsequent iteration introduced the optimized geometric structure addressing trade-offs in short channel effects, leakage currents, and switching speed, while balancing design and low threshold voltages (V<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</inf>: 0.13 V for NMOS, 0.1 V for PMOS). In Model 2(a), improved performance was seen with increase in drain radius, which enhancing the I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">ON</inf>/I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">OFF</inf> ratio. In contrast Model 2(b) demonstrated a better overall efficiency, by optimizing the source-drain geometry for lower Drain-Induced Barrier Lowering (DIBL) and improved subthreshold slopes. Meanwhile with compact design Model 3 achieves an impressive I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">ON</inf>/I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">OFF</inf> ratio of 1.15×10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">9</sup>, and exceptionally low leakage currents (I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">OFF</inf>: 1.40×10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">−12</sup> A for NMoS) making it highly suitable for energy-efficient and reliable applications. This step-by-step refinement underscores the potential for continuous advancements in CEG MoSFETs, driving the evolution of next-generation CMoS technology.

Panjab University (IN)
Sustainable cities and communities
Openalex Percentile: Top 86%
Advanced Surface Polishing Techniques
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