Constructing abundant 5d electron buffering interfaces for enhancing acidic water oxidation
Through metal–support interactions to modulate the electronic structure of Ru active sites, a Ru/Ta 2 O 5 ( v ) catalyst with abundant 5d electron buffering interfaces was fabricated to balance the trade-off between catalytic activity and stability.
Authors
- Jingzhi Shang (ORCID: https://orcid.org/0000-0002-7451-777X)
- Youcai Che
- Xupeng Qin
- Xiuxiu Zhang (ORCID: https://orcid.org/0000-0002-1839-1527)
- Xiangang Lin
- Yuhao Zhang (ORCID: https://orcid.org/0000-0001-9081-3125)
- Qinghua Liu (ORCID: https://orcid.org/0000-0003-4090-3311)
- Baojie Li (ORCID: https://orcid.org/0000-0002-1211-5222)
- Jing Zhang (ORCID: https://orcid.org/0000-0003-4998-5704)
- Chenyu Yang (ORCID: https://orcid.org/0000-0003-4100-1141)
- Yaling Jiang
Institutions
- University of Science and Technology of China (CN)
- Anhui University of Traditional Chinese Medicine (CN)
- National Synchrotron Radiation Laboratory (CN)
Publication Details
- Journal
- Journal of Materials Chemistry A
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d5ta03724g
- Citations
- 2
- Primary Topic
- Electrocatalysts for Energy Conversion
- Type
- article
- Field-Weighted Citation Impact
- 0.73