High-resolution and High-performance Quantum Dots Light-emitting Diode Based on Nanoimprint

Abstract The current high-resolution quantum dot light-emitting doides(QLEDs) fabricated by various quantum dots patterning techniques suffer from low efficiency mainly due to the passage of large leakage currents between pixels.To solve this issue a honeycomb Poly(methyl methacrylate) (PMMA) film was fabricated by nanoimprint technique and ap plied as a charge barrier layer in the QLED light emitting layer.The resulting red QLEDs with a resolution of 8 467 pixel per inch(PPI) were successfully fabricated.Due to the good insulating properties of PMMA the charge barrier layer suc cessfully isolates the electron transport layer and the hole transport layer.Therefore the leakage current of our device is greatly reduced compared to the device without charge barrier layer patterning and the external quantum efficiency (EQE) is greatly improved with a maximum EQE of 15. 31% and a maximum brightness of 100 274 cd/m 2 .Key words quantum dot light-emitting doides (QLEDs) nanoimprint high-resolution charge barrier layer

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Publication Details

Journal
Chinese Journal of Luminescence
Published
2025-01-01
DOI
https://doi.org/10.37188/cjl.20250009
Primary Topic
Nanofabrication and Lithography Techniques
Type
article
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article

High-resolution and High-performance Quantum Dots Light-emitting Diode Based on Nanoimprint

Xiaofeng Xie, Kaiyu Yang, Fushan Li, Xian Huang
Chinese Journal of Luminescence
Nanofabrication and Lithography Techniques
article

High-resolution and High-performance Quantum Dots Light-emitting Diode Based on Nanoimprint

Xiaofeng Xie, Kaiyu Yang, Fushan Li, Xian Huang
article en

Abstract

Abstract The current high-resolution quantum dot light-emitting doides(QLEDs) fabricated by various quantum dots patterning techniques suffer from low efficiency mainly due to the passage of large leakage currents between pixels.To solve this issue a honeycomb Poly(methyl methacrylate) (PMMA) film was fabricated by nanoimprint technique and ap plied as a charge barrier layer in the QLED light emitting layer.The resulting red QLEDs with a resolution of 8 467 pixel per inch(PPI) were successfully fabricated.Due to the good insulating properties of PMMA the charge barrier layer suc cessfully isolates the electron transport layer and the hole transport layer.Therefore the leakage current of our device is greatly reduced compared to the device without charge barrier layer patterning and the external quantum efficiency (EQE) is greatly improved with a maximum EQE of 15. 31% and a maximum brightness of 100 274 cd/m 2 .Key words quantum dot light-emitting doides (QLEDs) nanoimprint high-resolution charge barrier layer

Chinese Journal of LuminescenceVol. 46(6)
Affordable and clean energy
Openalex Percentile: Top 86%
Nanofabrication and Lithography Techniques
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High-resolution and High-performance Quantum Dots Light-emitting Diode Based on Nanoimprint — Xiaofeng Xie, Kaiyu Yang, et al. · Chinese Journal of Luminescence (2025) | TGRS Research Map | TGRS