Low-Temperature Degradation of Aflatoxins via Oxygen Plasma: Kinetics and Mechanism Driven by Atomic Oxygen Flux

Aflatoxins are toxic organic substances that are synthesized on the surfaces of seeds, nuts, and similar products by some fungi under elevated humidity. They decompose at temperatures well above 130 °C, so standard heating or autoclaving is an obsolete technique for the degradation of toxins on surfaces without significant modification of the treated material. Non-equilibrium plasma was used to degrade aflatoxins at low temperatures and determine the efficiency of O atoms. A commercial mixture of aflatoxins was deposited on smooth substrates, and the solvent was evaporated so that about a 3 nm thick film of dry toxins remained on the substrates. The samples were exposed to low-pressure oxygen plasma sustained by an inductively coupled radiofrequency (RF) discharge in either the E or H mode. The gas pressure was 20 Pa, the forward RF power was between 50 and 700 W, and the O-atom flux was between 1.2 × 10²³ and 1.5 × 10²⁴ m^-2 s^-1. Plasma treatment caused the rapid degradation of aflatoxins, whose concentration was deduced from the fluorescence signal at 455 nm upon excitation with a monochromatic source at 365 nm. The degradation was faster at higher discharge powers, but the degradation curves fitted well when plotted against the dose of O atoms. The experiments showed that the aflatoxin concentration dropped below the detection limit of the fluorescence probe after receiving the O-atom dose of just above 10²⁵ m^-2. This dose was achieved within 10 s of treatment in plasma in the H mode, and approximately a minute when plasma was in the E mode. The method provides a low-temperature solution for the efficient detoxification of agricultural products.