NIR photothermal activation in epoxy/thiol polymerization
Epoxy resins are widely employed due to their mechanical strength, thermal stability etc . A new approach is presented here to activate Epoxy/Thiol systems upon NIR light.
Authors
- Frédéric Dumur (ORCID: https://orcid.org/0000-0003-4872-094X)
- Michael Schmitt (ORCID: https://orcid.org/0000-0002-0819-6226)
- Didier Gigmès (ORCID: https://orcid.org/0000-0002-8833-8393)
- Julien Pinaud (ORCID: https://orcid.org/0000-0003-4446-3771)
- Jacques Lalevée (ORCID: https://orcid.org/0000-0001-9297-0335)
- Philibert Lenormand (ORCID: https://orcid.org/0009-0000-2847-6922)
- Rania Rejeb
Institutions
- École Nationale Supérieure de Chimie de Montpellier (FR)
- Centre National de la Recherche Scientifique (FR)
- Université de Montpellier (FR)
- Aix-Marseille Université (FR)
- Université de Haute-Alsace (FR)
- Université de Strasbourg (FR)
Publication Details
- Journal
- Polymer Chemistry
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d5py00565e
- Primary Topic
- Photopolymerization techniques and applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- Agence Nationale de la Recherche