Research on the performance enhancement effect of plasma-modified octavinyl- sesquioxane on polypropylene insulation materials for power cables
Abstract Polypropylene (PP), as a green and environmentally friendly material, is a potential material for power cable insulation. To improve the dielectric properties of PP cable insulation, octavinyl- sesquisiloxane (OV-POSS) was modified with the silane coupling agent KH550 and dielectric barrier discharge plasma treatment. PP nanocomposites containing elastomer-hydrogenated styrene–butadiene block copolymers (SEBS) were prepared by a melt blending method to investigate the effect of plasma-modified OV-POSS on the physicochemical and dielectric properties of the materials. The results show that the addition of OV-POSS nanoparticles, particularly after plasma treatment, significantly enhances the melting point and crystallinity of the composites. At room temperature, the DC breakdown strength of PP/30% SEBS/POSS nanocomposites with 1% mass fraction of plasma-modified OV-POSS reached 330.77 kV mm −1 , representing a 19.2% improvement over PP/30% SEBS. The DC conductivity was reduced by 7.3 times, 3.5 times and 3.14 times at electric field strengths of 10 kV mm −1 , 20 kV mm −1 and30 kV mm −1 . The average charge density growth rate reduced from 28% to 12.3% compared with PP/30% SEBS. Plasma treatment of OV-POSS at an optimal power of 94 W further improved the DC breakdown strength to 297.31 kV mm −1 , a 3.6% increase over the untreated sample, while reducing the DC conductivity at 10 kV mm −1 , 20 kV mm −1 and 30 kV mm −1 by 1.85, 1.71 and 1.4 times, respectively. The plasma-modified OV-POSS effectively inhibits the accumulation of space charge, with the average charge density growth rate being reduced from 25.3% to 5.7%. These findings provide a robust foundation for the development of advanced PP power cable insulation materials with enhanced dielectric properties.
Authors
- Man 曼 DING 丁 (ORCID: https://orcid.org/0000-0003-1727-5564)
- Qingfeng 清峰 ZHENG 郑
- Zicheng 子诚 XIE 谢
- Qichun 琪春 LI 李
- Chao 超 DAI 戴
Institutions
- Hohai University (CN)
Publication Details
- Journal
- Plasma Science and Technology
- Published
- 2025-06-18
- DOI
- https://doi.org/10.1088/2058-6272/ade5f3
- Primary Topic
- High voltage insulation and dielectric phenomena
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- China Postdoctoral Science Foundation