Highly transparent aluminum silicon oxy nitride permeation barriers for optoelectronic devices

We investigate the properties of sputtered aluminum silicon oxynitride layers for application as transparent permeation barrier front sheets for flexible opto-electronic applications. We compare the results from mixed aluminum-silicon and pure silicon targets when the reactive gas content is varied in a dynamic roll-to-roll process on the optical, structural, permeation properties of the layers. We observe that permeation barrier layers deposited from mixed aluminum-silicon targets shows a change in layer growth and the resulting properties compared with layers from a pure silicon Target. • Coating thickness determination of transparent permeation barrier coatings deposited in a dynamic magnetron sputtering process using X-ray reflectometry. • These layers behave like a multi-layer system in the optical simulation. • However, they can be measured as a single layer after appropriate preparation. • The result was confirmed on SEM cross-sections.