Dynamic buckling of Si tetramers on the Si(111)-7 × 7 surface

The atomic structure of Si tetramers that form on the Si(111)-7 × 7 surface during homoepitaxy is investigated by means of first-principles calculations with the currently available atomistic model as a starting point. It is demonstrated that the rectangular shape of the Si tetramer is unstable against buckling. The comparison of the calculated results with the available scanning tunneling microscopy (STM) data provides a new understanding of the problem, indicating that the recorded STM images are influenced by dynamic buckling.

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Publication Details

Journal
The Journal of Chemical Physics
Published
2025-06-17
DOI
https://doi.org/10.1063/5.0273497
Citations
1
Primary Topic
Surface and Thin Film Phenomena
Type
article
Field-Weighted Citation Impact
1.25

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article

Dynamic buckling of Si tetramers on the Si(111)-7 × 7 surface

R. A. Zhachuk, José Coutinho, D. V. Sheglov
1 citations
The Journal of Chemical Physics
Surface and Thin Film Phenomena
1.25
article

Dynamic buckling of Si tetramers on the Si(111)-7 × 7 surface

R. A. Zhachuk, José Coutinho, D. V. Sheglov
article en
1 citations

Abstract

The atomic structure of Si tetramers that form on the Si(111)-7 × 7 surface during homoepitaxy is investigated by means of first-principles calculations with the currently available atomistic model as a starting point. It is demonstrated that the rectangular shape of the Si tetramer is unstable against buckling. The comparison of the calculated results with the available scanning tunneling microscopy (STM) data provides a new understanding of the problem, indicating that the recorded STM images are influenced by dynamic buckling.

The Journal of Chemical PhysicsVol. 162(23)
Institute of Semiconductor Physics (RU), University of Aveiro (PT)
Russian Science Foundation, Fundação para a Ciência e a Tecnologia
Openalex Percentile: Top 20%
Surface and Thin Film Phenomena
1.25
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