Enhancing Seedling Vigor and Stress Tolerance Through ROS-Depleted Capacitively Coupled Plasma (RDCCP) Irradiation
Seedling establishment and vigor are crucial for crop productivity. Irradiating rice seeds with 13.56-MHz RF capacitively coupled Ar cold plasma, particularly at −400-V self-bias for 20 s, significantly enhanced these traits. This study assessed plant performance through biomass accumulation and various biochemical parameters, including enzymatic [superoxide dismutase (SOD), catalase (CAT), and glutathione reductase (GR)] and nonenzymatic (ascorbate (ASA) and glutathione) antioxidants. Unlike conventional plasma treatments reliant on reactive oxygen and nitrogen species reactive oxygen species (ROS)/reactive nitrogen species (RNS), our ROS-depleted capacitively coupled plasma (RDCCP) showed efficacy in improving seedling vigor independently of ROS/RNS. Enhanced water uptake via micropores facilitated early seedling establishment. Testing RDCCP on mung bean demonstrated its broad applicability and effectiveness against NaCl, PEG-6000, and arsenic stresses. The ion bombardment through the plasma sheath increased seed surface permeability, activating the plant’s innate defense system, thus improving performance under both control and stress conditions.
Authors
- Rajib Kar (ORCID: https://orcid.org/0000-0002-7118-8405)
- Vanita Sekar
- Ashish Kumar Srivastava (ORCID: https://orcid.org/0000-0003-2834-1483)
- Manish K. Pandey (ORCID: https://orcid.org/0000-0002-4101-6530)
- R. L. Bhardwaj
Institutions
- Bhabha Atomic Research Centre (IN)
- Homi Bhabha National Institute (IN)
Publication Details
- Journal
- IEEE Transactions on Plasma Science
- Published
- 2025-06-17
- DOI
- https://doi.org/10.1109/tps.2025.3573082
- Primary Topic
- Light effects on plants
- Type
- article
- Field-Weighted Citation Impact
- 0.00