Interfacial chemical bond engineering on a Te semiconductor to weaken carrier–phonon coupling to boost thermoelectric conversion performance

The thermoelectric performance of Te-based semiconductors can be boosted by utilizing interfacial chemical-bonding heterogeneity without doping the matrix lattice. The dual p-p type heterointerfaces obtained through introducing metavalently bonded Bi<sub>2</sub>Te<sub>3</sub> and covalently bonded B into Te enable obvious carrier-phonon decoupling.

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Publication Details

Journal
Chemical Communications
Published
2025-01-01
DOI
https://doi.org/10.1039/d5cc02836a
Citations
1
Primary Topic
Advanced Thermoelectric Materials and Devices
Type
article
Field-Weighted Citation Impact
0.52

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article

Interfacial chemical bond engineering on a Te semiconductor to weaken carrier–phonon coupling to boost thermoelectric conversion performance

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article

Interfacial chemical bond engineering on a Te semiconductor to weaken carrier–phonon coupling to boost thermoelectric conversion performance

Decheng An, Zhiyong Si, Min Liu, Yue Wang, Xianming Zhang, Wutao Yang
article en
1 citations

Abstract

The thermoelectric performance of Te-based semiconductors can be boosted by utilizing interfacial chemical-bonding heterogeneity without doping the matrix lattice. The dual p-p type heterointerfaces obtained through introducing metavalently bonded Bi<sub>2</sub>Te<sub>3</sub> and covalently bonded B into Te enable obvious carrier-phonon decoupling.

Chemical CommunicationsVol. 61(59)
Taiyuan University of Technology (CN)
National Natural Science Foundation of China
Openalex Percentile: Top 37%
Advanced Thermoelectric Materials and Devices
0.52
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