Gate-driven band modulation hyperdoping for high-performance p-type 2D semiconductor transistors

Tailoring carrier density in atomically thin two-dimensional (2D) semiconductors is challenging because of the inherently limited physical space for incorporating charge dopants. Here, we report that interlayer charge-transfer doping in type III van der Waals heterostructures can be greatly modulated by an external gate to realize a hyperdoping effect. Systematic gated-Hall measurements revealed that the modulated carrier density is about five times that of the gate capacitive charge, achieving an ultrahigh 2D hole density of 1.49 × 10<sup>14</sup> per square centimeter, far exceeding the maximum possible electrostatic doping limit imposed by typical dielectric breakdown. The highly efficient hole-doping enables high-performance p-type 2D transistors with an ultralow contact resistance of ~0.041 kilohm micrometers and a record-high ON-state current density of ~2.30 milliamperes per micrometer.

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Publication Details

Journal
Science
Published
2025-06-12
DOI
https://doi.org/10.1126/science.adp8444
Citations
27
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
13.98
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article

Gate-driven band modulation hyperdoping for high-performance p-type 2D semiconductor transistors

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27 citations
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article

Gate-driven band modulation hyperdoping for high-performance p-type 2D semiconductor transistors

Bei Zhao, Xidong Duan, Zucheng Zhang, Xiangfeng Duan, Lin Miao, Zhao Chen, Zhenhua Ni, Dingli Guo, Junpeng Lü, Tiancheng Gu, Jia Li, Kun He, Junqing Xu, Guiming He, Quan Ren, Ping Lü
article en
27 citations

Abstract

Tailoring carrier density in atomically thin two-dimensional (2D) semiconductors is challenging because of the inherently limited physical space for incorporating charge dopants. Here, we report that interlayer charge-transfer doping in type III van der Waals heterostructures can be greatly modulated by an external gate to realize a hyperdoping effect. Systematic gated-Hall measurements revealed that the modulated carrier density is about five times that of the gate capacitive charge, achieving an ultrahigh 2D hole density of 1.49 × 10<sup>14</sup> per square centimeter, far exceeding the maximum possible electrostatic doping limit imposed by typical dielectric breakdown. The highly efficient hole-doping enables high-performance p-type 2D transistors with an ultralow contact resistance of ~0.041 kilohm micrometers and a record-high ON-state current density of ~2.30 milliamperes per micrometer.

ScienceVol. 388(6752)
University of California, Los Angeles (US), Hefei University of Technology (CN), Hunan University (CN), Ministry of Education (BD), Southeast University (CN)
Affordable and clean energy
Openalex Percentile: Top 1%
2D Materials and Applications
13.98
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