Adaptive Epitaxy of C‐Si‐Ge‐Sn: Customizable Bulk and Quantum Structures

The successful demonstration of (Si)Ge<sub>1-x</sub>Sn<sub>x</sub> alloys as direct-gap materials for infrared lasers has driven intense research on group IV-based devices for nanoelectronics, energy harvesting, and quantum computing applications. The material palette of direct-gap group-IV alloys can be further extended by introducing carbon to fine-tune their structural and electronic properties, significantly expanding their functionality. This work presents heteroepitaxial growth of C(Si)GeSn alloys using an industry-standard reduced-pressure chemical vapor deposition reactor. The introduction of CBr<sub>4</sub> as a precursor enables controlled incorporation of C atoms (<1 at.%) into the epilayer lattice, while simultaneously increasing the Sn content in the CGeSn alloy up to ≈18 at.%. Carbon plays a key role in modulating strain, stabilizing the crystal structure, and influencing material properties. By leveraging alloying and strain engineering, quaternary CSiGeSn bulk layers and CGeSn/GeSn heterostructures are epitaxially grown. The impact of C incorporation on optical emission is investigated in LEDs based on CGeSn/GeSn multiple quantum wells, demonstrating enhanced near-infrared emission at 2.54 µm, which is sustained up to room temperature.

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Publication Details

Journal
Advanced Materials
Published
2025-06-11
DOI
https://doi.org/10.1002/adma.202506919
Citations
3
Primary Topic
Photonic and Optical Devices
Type
article
Field-Weighted Citation Impact
2.19

Funders

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article

Adaptive Epitaxy of C‐Si‐Ge‐Sn: Customizable Bulk and Quantum Structures

A. T. Tiedemann, Omar Concepción, Lukas Seidel, Markus Andreas Schubert et al.
3 citations
Advanced Materials
Photonic and Optical Devices
2.19
article

Adaptive Epitaxy of C‐Si‐Ge‐Sn: Customizable Bulk and Quantum Structures

A. T. Tiedemann, Omar Concepción, Lukas Seidel, Markus Andreas Schubert, Jin Hee Bae, Dan Buca, Michael Oehme, Qing‐Tai Zhao, Christopher A. Broderick, Detlev Grützmacher, Florian Bärwolf, Marvin Zöllner, Giovanni Capellini, Vincent Reboud, Alexei Tchelnokov, Ambrishkumar J. Devaiya
article en
3 citations

Abstract

The successful demonstration of (Si)Ge<sub>1-x</sub>Sn<sub>x</sub> alloys as direct-gap materials for infrared lasers has driven intense research on group IV-based devices for nanoelectronics, energy harvesting, and quantum computing applications. The material palette of direct-gap group-IV alloys can be further extended by introducing carbon to fine-tune their structural and electronic properties, significantly expanding their functionality. This work presents heteroepitaxial growth of C(Si)GeSn alloys using an industry-standard reduced-pressure chemical vapor deposition reactor. The introduction of CBr<sub>4</sub> as a precursor enables controlled incorporation of C atoms (<1 at.%) into the epilayer lattice, while simultaneously increasing the Sn content in the CGeSn alloy up to ≈18 at.%. Carbon plays a key role in modulating strain, stabilizing the crystal structure, and influencing material properties. By leveraging alloying and strain engineering, quaternary CSiGeSn bulk layers and CGeSn/GeSn heterostructures are epitaxially grown. The impact of C incorporation on optical emission is investigated in LEDs based on CGeSn/GeSn multiple quantum wells, demonstrating enhanced near-infrared emission at 2.54 µm, which is sustained up to room temperature.

Advanced MaterialsVol. 37(37)
University of Stuttgart (DE), Roma Tre University (IT), Forschungszentrum Jülich (DE), Commissariat à l'Énergie Atomique et aux Énergies Alternatives (FR), University College Cork (IE), CEA Grenoble (FR), Laboratoire d'Électronique des Technologies de l'Information (FR), Leibniz Institute for High Performance Microelectronics (DE)
Royal Asiatic Society of Great Britain and Ireland, European Commission, Deutsche Forschungsgemeinschaft
Openalex Percentile: Top 12%
Photonic and Optical Devices
2.19
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