Development of Innovative Self-Aligned SSL Mold (SASM) Scheme with Remarkable Reduction of Chip Size

We developed a Self-Aligned String-Select-Line (SSL) Mold (SASM) scheme where the SSL transistors are independently formed after the main word-line structure, which doesn’t need any dummy hole strings for SSL separation process. The SASM scheme can maximize the gross die by more than 11% by enabling higher density of cell array in the lateral direction. Critical cell characteristics such as erase efficiency, SSL operation window, SSL HCI, cell current, and SSL resistance (SSL RS) are optimized by improving fabrication and operation conditions. The SASM scheme has been successfully integrated in the 9th-generation Vertical NAND (V-NAND) product, suggesting novel memory cell design for next generation V-NAND product with higher bit density and reduced chip size.

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Published
2025-05-18
DOI
https://doi.org/10.1109/imw61990.2025.11026943
Primary Topic
Advanced Surface Polishing Techniques
Type
article
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article

Development of Innovative Self-Aligned SSL Mold (SASM) Scheme with Remarkable Reduction of Chip Size

Jihoon Choi, G. Lee, Dongsik Lee, Yujeong Seo et al.
4 links
Advanced Surface Polishing Techniques
article

Development of Innovative Self-Aligned SSL Mold (SASM) Scheme with Remarkable Reduction of Chip Size

Jihoon Choi, G. Lee, Dongsik Lee, Yujeong Seo, Suk‐Kang Sung, Byoungil Lee, Minkyu Jeong, Seungwan Hong, Joonam Kim, Byung‐Soo Kim, Joon Kim, Sejun Park, Junyoung Lee, Jongyoon Choi, Jaeyoung Shin, Sung‐Hoi Hur
article en

Abstract

We developed a Self-Aligned String-Select-Line (SSL) Mold (SASM) scheme where the SSL transistors are independently formed after the main word-line structure, which doesn’t need any dummy hole strings for SSL separation process. The SASM scheme can maximize the gross die by more than 11% by enabling higher density of cell array in the lateral direction. Critical cell characteristics such as erase efficiency, SSL operation window, SSL HCI, cell current, and SSL resistance (SSL RS) are optimized by improving fabrication and operation conditions. The SASM scheme has been successfully integrated in the 9th-generation Vertical NAND (V-NAND) product, suggesting novel memory cell design for next generation V-NAND product with higher bit density and reduced chip size.

Samsung (South Korea) (KR)
Industry, innovation and infrastructure
Openalex Percentile: Top 88%
Advanced Surface Polishing Techniques
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