NiFeWP Thin Film Optimization for Aerospace Applications-Annealing Effect on Mechanical and Magnetic Properties

This study examines the impact of annealing in the mechanical, magnetic, and structural characteristics of NiFeWP thin layers electrodeposited over a copper substrate. The thin films were deposited for 30 minutes at 40°C with a constant current density of 1 A/dm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>, and then they were annealed for three hours at 250°C. The results of XRD proved that annealing enhanced the grain size and crystallinity of the films. Corrosion studies using EIS revealed that annealed films had higher corrosion resistance and lower corrosion rates compared with as-deposited films. The VSM results showed that annealing improved the soft magnetic properties by decreasing coercivity and improving saturation magnetization. The results obtained specify that the process of annealing significantly improves the overall performance of NiFeWP thin films, making them suitable for advanced applications in Aerospace, Automotive, and MEMS technologies. magnetization.