Achieving Forming-Free NbO<sub> <i>x</i> </sub> Mott Memristors With High Performance Through Lithium Intercalation

In recent years, niobium oxide (NbO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><i>x</i></sub>)-based Mott memristors have attracted considerable attention due to their promising applications in neuromorphic computing. However, the relatively high voltages required for the electroforming process pose a significant challenge to their large-scale integration. To address this issue, in this work, a thin layer of lithium titanate (Li<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>4</roman></sub>Ti<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>5</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>12</roman></sub>, LTO) is introduced to intercalate lithium ions into the NbO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><i>x</i></sub> switching layer within a device structured as Pt/LTO/Nb/ NbO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><i>x</i></sub>/W/Ti, successfully achieving a forming-free NbO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><i>x</i></sub> Mott memristor. This modification not only enables the forming-free operation but also results in a marked reduction in the threshold current, lowering it to 19 μA, a sig-nificant improvement compared to >100 μA observed in the control sample without the intercalated layer, thereby substantially reducing energy consumption. Moreover, the composition and migration of Li<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> ions are elucidated through electron energy loss spectroscopy (EELS). Finally, to demonstrate the practical application of these forming-free memristors, an oscillation circuit is constructed to demonstrate its potential application in artificial neurons.

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Journal
IEEE Transactions on Electron Devices
Published
2025-06-11
DOI
https://doi.org/10.1109/ted.2025.3574134
Citations
1
Primary Topic
Advanced Memory and Neural Computing
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article
Field-Weighted Citation Impact
0.73

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article

Achieving Forming-Free NbO x Mott Memristors With High Performance Through Lithium Intercalation

Chenrong Gong, Weihua Liu, Chuanyu Han, Shiquan Fan et al.
1 citations
IEEE Transactions on Electron Devices
Advanced Memory and Neural Computing
0.73
article

Achieving Forming-Free NbO x Mott Memristors With High Performance Through Lithium Intercalation

Chenrong Gong, Weihua Liu, Chuanyu Han, Shiquan Fan, Li Geng, Yihao Wang, Juan Hu, Guohe Zhang, Yubin Yuan, Xin Li, Shujing Zhao
article en
1 citations

Abstract

In recent years, niobium oxide (NbO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><i>x</i></sub>)-based Mott memristors have attracted considerable attention due to their promising applications in neuromorphic computing. However, the relatively high voltages required for the electroforming process pose a significant challenge to their large-scale integration. To address this issue, in this work, a thin layer of lithium titanate (Li<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>4</roman></sub>Ti<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>5</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>12</roman></sub>, LTO) is introduced to intercalate lithium ions into the NbO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><i>x</i></sub> switching layer within a device structured as Pt/LTO/Nb/ NbO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><i>x</i></sub>/W/Ti, successfully achieving a forming-free NbO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><i>x</i></sub> Mott memristor. This modification not only enables the forming-free operation but also results in a marked reduction in the threshold current, lowering it to 19 μA, a sig-nificant improvement compared to >100 μA observed in the control sample without the intercalated layer, thereby substantially reducing energy consumption. Moreover, the composition and migration of Li<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> ions are elucidated through electron energy loss spectroscopy (EELS). Finally, to demonstrate the practical application of these forming-free memristors, an oscillation circuit is constructed to demonstrate its potential application in artificial neurons.

IEEE Transactions on Electron DevicesVol. 72(7)
Second Affiliated Hospital of Xi'an Jiaotong University (CN), Xi'an Jiaotong University (CN)
National Natural Science Foundation of China, National Key Research and Development Program of China
Affordable and clean energy
Openalex Percentile: Top 27%
Advanced Memory and Neural Computing
0.73
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