Decorating nonpolar units in robust MOFs for one-step purification of C<sub>2</sub>H<sub>4</sub> from C<sub>2</sub>H<sub>2</sub>/C<sub>2</sub>H<sub>4</sub>/C<sub>2</sub>H<sub>6</sub>

A post-synthetic modification approach was proposed to introduce nonpolar unit ferrocene into a C<sub>2</sub>H<sub>2</sub>-selective MOF to enhance C<sub>2</sub>H<sub>6</sub> selectivity. Benefiting from the nonpolar moieties and suitable pore confinement, the obtained materials exhibited higher selectivity for C<sub>2</sub>H<sub>6</sub> and C<sub>2</sub>H<sub>2</sub> over C<sub>2</sub>H<sub>4</sub>, achieving one-step purification of high-purity C<sub>2</sub>H<sub>4</sub> from a ternary C<sub>2</sub> mixture.

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Publication Details

Journal
Chemical Communications
Published
2025-01-01
DOI
https://doi.org/10.1039/d5cc02604k
Citations
1
Primary Topic
Metal-Organic Frameworks: Synthesis and Applications
Type
article
Field-Weighted Citation Impact
0.54

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article

Decorating nonpolar units in robust MOFs for one-step purification of C2H4 from C2H2/C2H4/C2H6

Zheng‐Bo Han, Rui Song, Lin Liu, Qi Zhang
1 citations
Chemical Communications
Metal-Organic Frameworks: Synthesis and Applications
0.54
article

Decorating nonpolar units in robust MOFs for one-step purification of C2H4 from C2H2/C2H4/C2H6

Zheng‐Bo Han, Rui Song, Lin Liu, Qi Zhang
article en
1 citations

Abstract

A post-synthetic modification approach was proposed to introduce nonpolar unit ferrocene into a C<sub>2</sub>H<sub>2</sub>-selective MOF to enhance C<sub>2</sub>H<sub>6</sub> selectivity. Benefiting from the nonpolar moieties and suitable pore confinement, the obtained materials exhibited higher selectivity for C<sub>2</sub>H<sub>6</sub> and C<sub>2</sub>H<sub>2</sub> over C<sub>2</sub>H<sub>4</sub>, achieving one-step purification of high-purity C<sub>2</sub>H<sub>4</sub> from a ternary C<sub>2</sub> mixture.

Chemical CommunicationsVol. 61(54)
Liaoning University (CN)
National Natural Science Foundation of China
Openalex Percentile: Top 35%
Metal-Organic Frameworks: Synthesis and Applications
0.54
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