A Comprehensive 9T Standard Cell Framework for Bridging VLSI Education and Industry Practices using GPDK045

A novel framework fo VLSI education is presented, addressing the widening gap between academic instruction and industry practices. At its core lies a 9-track standard cell library, designed using GPDK045 in Cadence Virtuoso with a 0.395-micron constant poly pitch. The approach integrates industry-standard verification processes, including DRC and LVS checks, alongside comprehensive evaluation methodologies for delay and transition analysis. Advanced features such as abutment testing and automated abstract generation are incorporated. The resulting holistic methodology provides students with hands-on experience using cutting-edge tools, preparing them for modern semiconductor industry challenges. This paper details the implementation and discusses the framework’s potential impact on VLSI education and workforce readiness.

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Publication Details

Published
2024-12-20
DOI
https://doi.org/10.1109/iccit64611.2024.11022398
Primary Topic
Advanced Surface Polishing Techniques
Type
article
Field-Weighted Citation Impact
0.00
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article

A Comprehensive 9T Standard Cell Framework for Bridging VLSI Education and Industry Practices using GPDK045

Atoshe Islam Sumaya, Touhidur Rahman, Imtiaj-Mrida Saiem
Advanced Surface Polishing Techniques
article

A Comprehensive 9T Standard Cell Framework for Bridging VLSI Education and Industry Practices using GPDK045

Atoshe Islam Sumaya, Touhidur Rahman, Imtiaj-Mrida Saiem
article en

Abstract

A novel framework fo VLSI education is presented, addressing the widening gap between academic instruction and industry practices. At its core lies a 9-track standard cell library, designed using GPDK045 in Cadence Virtuoso with a 0.395-micron constant poly pitch. The approach integrates industry-standard verification processes, including DRC and LVS checks, alongside comprehensive evaluation methodologies for delay and transition analysis. Advanced features such as abutment testing and automated abstract generation are incorporated. The resulting holistic methodology provides students with hands-on experience using cutting-edge tools, preparing them for modern semiconductor industry challenges. This paper details the implementation and discusses the framework’s potential impact on VLSI education and workforce readiness.

BRAC University (BD)
Industry, innovation and infrastructure
Openalex Percentile: Top 74%
Advanced Surface Polishing Techniques
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