The Effect of Deposition Temperature on the Photodegradation Performance of Seed-Layer-Free ZnO Nanorods: Considering Textile Wastewater

The aim of this work is to investigate the effect of deposition temperature on the photodegradation performance of ZnO nanorods (NRs). These ZnO NRs are prepared on seedlayer-free glass substrates by an inexpensive, uncover and simple hydrothermal method with various deposition temperatures. These ZnO thin films are used as photocatalysts for the degradation of textile wastewater. The photodegradation performance was assessed by varying the deposition temperatures within the range of 75-115°C. Hexagonal nanorods covered the entire surface of the ZnO films. The highest photodegradation efficiency has been achieved with a thin film produced at a deposition temperature of 75°C, exhibiting an efficiency of approximately 65%. The various characteristics of the ZnO NRs created at different deposition temperatures have been correlated with the photodegradation capabilities for textile wastewater treated with these ZnO NRs