High On/Off ratio and robust photo-stability by interstitial composition in a-IGTO/TiOx TFT

• Ultra thin a-IGTO/TiO x TFTs fabricated using sputtering-induced low temperature activation. • Interstitial composition between a-IGTO and TiO x generated oxygen vacancies and Ti-O bonding. • Interstitials and vacancy trap formation regulate EHP generation, enhancing illumination reliability. • Reduced threshold voltage shifts and improved I on /I off ratios under different illumination stresses. • Enhanced electrical characteristics in ultra-thin a-IGTO/TiO x TFTs compared to conventional devices. We present a significant breakthrough in the development of amorphous oxide semiconductor (AOS)-based thin-film transistors (TFTs), with particular emphasis on their potential for flexible and transparent electronic applications. Our work addresses the challenge of creating high-performance TFTs on flexible substrates, which require low-temperature processing owing to their material properties. By focusing on amorphous indium–gallium–tin oxide (a-IGTO) and leveraging the unique Ti–O bonding characteristics during sputtering, we successfully induced interstitial composition between a-IGTO and Titanium oxide (TiO x ). This interaction generated oxygen vacancies that greatly improved the electrical performance of the ultra-thin AOS TFTs. Our results show that incorporating TiO x into a-IGTO during low-temperature fabrication leads to a substantial increase in electron concentration, resulting in over a 30-fold increase in mobility and more than a 50-fold improvement in on-current. Moreover, the controlled formation of vacancy traps was crucial for enhancing the illumination stability, as evidenced by in the reduced threshold voltage shifts and improved I on /I off ratios under different illumination stresses. By addressing the inherent trade-off between the high-temperature annealing typically required for optimal TFT performance and the low-temperature processing essential for flexible substrates, the present study offers a promising strategy for producing high-performance AOS-based TFTs.

Authors

Institutions

Publication Details

Journal
Applied Surface Science
Published
2025-06-07
DOI
https://doi.org/10.1016/j.apsusc.2025.163735
Citations
1
Primary Topic
Thin-Film Transistor Technologies
Type
article
Field-Weighted Citation Impact
0.73

Funders

Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

High On/Off ratio and robust photo-stability by interstitial composition in a-IGTO/TiOx TFT

Moonsoo Kim, Hwan-gyu Lee, Kyeong‐Bae Lee, J. Cho et al.
1 citations
Applied Surface Science
Thin-Film Transistor Technologies
0.73
article

High On/Off ratio and robust photo-stability by interstitial composition in a-IGTO/TiOx TFT

Moonsoo Kim, Hwan-gyu Lee, Kyeong‐Bae Lee, J. Cho, Byoungdeog Choi
article en
1 citations

Abstract

• Ultra thin a-IGTO/TiO x TFTs fabricated using sputtering-induced low temperature activation. • Interstitial composition between a-IGTO and TiO x generated oxygen vacancies and Ti-O bonding. • Interstitials and vacancy trap formation regulate EHP generation, enhancing illumination reliability. • Reduced threshold voltage shifts and improved I on /I off ratios under different illumination stresses. • Enhanced electrical characteristics in ultra-thin a-IGTO/TiO x TFTs compared to conventional devices. We present a significant breakthrough in the development of amorphous oxide semiconductor (AOS)-based thin-film transistors (TFTs), with particular emphasis on their potential for flexible and transparent electronic applications. Our work addresses the challenge of creating high-performance TFTs on flexible substrates, which require low-temperature processing owing to their material properties. By focusing on amorphous indium–gallium–tin oxide (a-IGTO) and leveraging the unique Ti–O bonding characteristics during sputtering, we successfully induced interstitial composition between a-IGTO and Titanium oxide (TiO x ). This interaction generated oxygen vacancies that greatly improved the electrical performance of the ultra-thin AOS TFTs. Our results show that incorporating TiO x into a-IGTO during low-temperature fabrication leads to a substantial increase in electron concentration, resulting in over a 30-fold increase in mobility and more than a 50-fold improvement in on-current. Moreover, the controlled formation of vacancy traps was crucial for enhancing the illumination stability, as evidenced by in the reduced threshold voltage shifts and improved I on /I off ratios under different illumination stresses. By addressing the inherent trade-off between the high-temperature annealing typically required for optimal TFT performance and the low-temperature processing essential for flexible substrates, the present study offers a promising strategy for producing high-performance AOS-based TFTs.

Applied Surface ScienceVol. 709
Sungkyunkwan University (KR)
Ministry of Trade, Industry and Energy, Korea Institute for Advancement of Technology
Openalex Percentile: Top 27%
Thin-Film Transistor Technologies
0.73
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.