First Demonstration of CuCrO<sub>2</sub>/β-Ga<sub>2</sub>O<sub>3</sub> p-n Heterojunction Diode With High Breakdown Voltage and Low Leakage Current

We demonstrate for the first time a high-performance CuCrO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>/β-gallium oxide (β-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub>) p-n heterojunction diode (HJD) with high breakdown voltage and low leakage current. Without any composite termination structure, the CuCrO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>/β-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub> HJD reached a high breakdown voltage of 1.46 kV with low leakage current of 10 μA/cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sup>, which is almost four times improvement over the traditional β-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub> Schottky barrier diodes (SBDs). Simultaneously, the HJD exhibited a turn-on voltage of 1.62 V and a relatively low specific on-resistance of 5.36 mΩ⋅cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sup>, yielding a power figure of merit (PFOM) of 0.4 GW/cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sup>. The measurements of temperature-dependent current density–voltage (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">J</i>–<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i>) showed that the HJD exhibited good thermal reliability and carrier transport got increasingly dominated by interface recombination at higher temperatures. Furthermore, a type-II band alignment was identified in the CuCrO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>/ β-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub> heterojunction with a valence band offset of 2.22 eV and a conduction band offset of 0.45 eV, respectively, as determined by the X-ray photoelectron spectroscopy (XPS) characterizations. Technology computer aided design (TCAD) simulations indicated that the depletion region primarily extended into the Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub> epitaxial region due to the full depletion of the p-CuCrO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub> layer, which contributes to a more uniform distribution of electric field and higher breakdown voltages. Evidently, these results indicate that the formation of heterojunction by introducing a p-CuCrO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub> layer is feasible and effective for achieving high-performance and improving manufacturing of β-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub> bipolar power diodes.

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Journal
IEEE Transactions on Electron Devices
Published
2025-06-06
DOI
https://doi.org/10.1109/ted.2025.3575742
Citations
1
Primary Topic
Ga2O3 and related materials
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article
Field-Weighted Citation Impact
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article

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First Demonstration of CuCrO2/β-Ga2O3 p-n Heterojunction Diode With High Breakdown Voltage and Low Leakage Current

Jialong Lin, Chengyi Tian, Weifeng Yang, Xinwei Wang, Feng Zhang, Ying Li, Guoliang Zhang, Shubo Wei
article en
1 citations

Abstract

We demonstrate for the first time a high-performance CuCrO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>/β-gallium oxide (β-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub>) p-n heterojunction diode (HJD) with high breakdown voltage and low leakage current. Without any composite termination structure, the CuCrO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>/β-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub> HJD reached a high breakdown voltage of 1.46 kV with low leakage current of 10 μA/cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sup>, which is almost four times improvement over the traditional β-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub> Schottky barrier diodes (SBDs). Simultaneously, the HJD exhibited a turn-on voltage of 1.62 V and a relatively low specific on-resistance of 5.36 mΩ⋅cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sup>, yielding a power figure of merit (PFOM) of 0.4 GW/cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sup>. The measurements of temperature-dependent current density–voltage (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">J</i>–<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i>) showed that the HJD exhibited good thermal reliability and carrier transport got increasingly dominated by interface recombination at higher temperatures. Furthermore, a type-II band alignment was identified in the CuCrO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>/ β-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub> heterojunction with a valence band offset of 2.22 eV and a conduction band offset of 0.45 eV, respectively, as determined by the X-ray photoelectron spectroscopy (XPS) characterizations. Technology computer aided design (TCAD) simulations indicated that the depletion region primarily extended into the Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub> epitaxial region due to the full depletion of the p-CuCrO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub> layer, which contributes to a more uniform distribution of electric field and higher breakdown voltages. Evidently, these results indicate that the formation of heterojunction by introducing a p-CuCrO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub> layer is feasible and effective for achieving high-performance and improving manufacturing of β-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub> bipolar power diodes.

IEEE Transactions on Electron DevicesVol. 72(8)
Xiamen University (CN), Institute of Microelectronics (CN)
National Natural Science Foundation of China
Affordable and clean energy
Openalex Percentile: Top 41%
Ga2O3 and related materials
0.43
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