Optical Design of an Ambient Pressure / UHV X-ray Photoelectron Spectroscopy Beamline at the Taiwan Photon Source

Abstract An ambient pressure / UHV X-ray photoelectron spectroscopy beamline is designed to study critical physical and chemical processes, including catalysis, energy storage, and environmental science. The source of the beamline is from an elliptically polarizing undulator to cover the photon energy range from 200 to 3000 eV. In this optical design, the grating paired with the active mirror is applied to improve the impact of the optical aberrations and keep the light at the exit slit in focus. All parameters of optical components at the beamline are verified by a ray-tracing method and the expected performances are discussed.