Surface Fermi level tuning in thin epitaxial Bi<i>y</i>Sb2−<i>y</i>Te3−<i>x</i>Se<i>x</i>/Si(111) films

The effects of chemical treatment and aging of BiySb2−yTe3−xSex 3D topological insulator (TI) thin films on the surface electronic structure, morphology, and transport properties have been studied. The surface conditions significantly affect the separation between the Dirac point (DP) and the Fermi level, which is evident in both photoemission and magnetotransport measurements and is explained by the band bending. Depending on the Fermi level's position relative to the DP, the contribution of topological surface states to the nonlinear Hall effect can be solely controlled by the antilocalization effect or enhanced by the effect of gap opening. The wide tuning of the surface Fermi level by the surface/interface modification could be utilized in metal–insulator–semiconductor structures based on a TI thin films.

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Publication Details

Journal
Applied Physics Letters
Published
2025-06-02
DOI
https://doi.org/10.1063/5.0260935
Primary Topic
Topological Materials and Phenomena
Type
article
Field-Weighted Citation Impact
0.00

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article

Surface Fermi level tuning in thin epitaxial BiySb2−yTe3−xSex/Si(111) films

N. Kumar, A. O. Bazhenov, О. Е. Терещенко, V. A. Golyashov et al.
4 links
Applied Physics Letters
Topological Materials and Phenomena
article

Surface Fermi level tuning in thin epitaxial BiySb2−yTe3−xSex/Si(111) films

N. Kumar, A. O. Bazhenov, О. Е. Терещенко, V. A. Golyashov, A. V. Shumilin, N. P. Stepina, Д. В. Ищенко
article en

Abstract

The effects of chemical treatment and aging of BiySb2−yTe3−xSex 3D topological insulator (TI) thin films on the surface electronic structure, morphology, and transport properties have been studied. The surface conditions significantly affect the separation between the Dirac point (DP) and the Fermi level, which is evident in both photoemission and magnetotransport measurements and is explained by the band bending. Depending on the Fermi level's position relative to the DP, the contribution of topological surface states to the nonlinear Hall effect can be solely controlled by the antilocalization effect or enhanced by the effect of gap opening. The wide tuning of the surface Fermi level by the surface/interface modification could be utilized in metal–insulator–semiconductor structures based on a TI thin films.

Applied Physics LettersVol. 126(22)
Novosibirsk State University (RU), National Research Tomsk State University (RU), Parc Científic de la Universitat de València (ES), Institute of Semiconductor Physics (RU)
Russian Science Foundation
Openalex Percentile: Top 90%
Topological Materials and Phenomena
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Surface Fermi level tuning in thin epitaxial Bi<i>y</i>Sb2−<i>y</i>Te3−<i>x</i>Se<i>x</i>/Si(111) films — N. Kumar, A. O. Bazhenov, et al. · Applied Physics Letters (2025) | TGRS Research Map | TGRS